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2022
Тема вÑпÑÑкной квалиÑикаÑионной ÑабоÑÑ: «ÐÑÑледование влиÑÐ½Ð¸Ñ Ð´Ð¾Ð±Ð°Ð²Ð»ÐµÐ½Ð¸Ñ Ð¸ÑÑÑÐ¸Ñ Ð¿Ñи ÑелекÑивном лазеÑном плавлении жаÑопÑоÑного никелевого Ñплава». ÐÐ°Ð½Ð½Ð°Ñ ÑабоÑа поÑвÑÑена иÑÑÐ»ÐµÐ´Ð¾Ð²Ð°Ð½Ð¸Ñ Ð²Ð¾Ð·
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Тема вÑпÑÑкной квалиÑикаÑионной ÑабоÑÑ: «ÐÑÑледование влиÑÐ½Ð¸Ñ Ð´Ð¾Ð±Ð°Ð²Ð»ÐµÐ½Ð¸Ñ Ð¸ÑÑÑÐ¸Ñ Ð¿Ñи ÑелекÑивном лазеÑном плавлении жаÑопÑоÑного никелевого Ñплава». ÐÐ°Ð½Ð½Ð°Ñ ÑабоÑа поÑвÑÑена иÑÑÐ»ÐµÐ´Ð¾Ð²Ð°Ð½Ð¸Ñ Ð²Ð¾Ð·
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2022
Тема вÑпÑÑкной квалиÑикаÑионной ÑабоÑÑ: «ÐÑÑледование пÑоÑеÑÑа ÑелекÑивной лазеÑной плавки инÑеÑмеÑаллидов ÑиÑана и ÑвойÑÑв полÑÑеннÑÑ Ð¾Ð±ÑазÑов».
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Тема вÑпÑÑкной квалиÑикаÑионной ÑабоÑÑ: «ÐÑÑледование пÑоÑеÑÑа ÑелекÑивной лазеÑной плавки инÑеÑмеÑаллидов ÑиÑана и ÑвойÑÑв полÑÑеннÑÑ Ð¾Ð±ÑазÑов».
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2019
A present work is aimed at experimental and numerical study of capacitively coupled radio frequency (RF) discharge properties for silicon nitride and silicon dioxide thin films etching. The main goal of this work is study of the effect of helium addition to the Ðе/SF6/H2 mixture on the SF6 and H2 dissociation degree, nitride and silicon dioxide ...
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A present work is aimed at experimental and numerical study of capacitively coupled radio frequency (RF) discharge properties for silicon nitride and silicon dioxide thin films etching. The main goal of this work is study of the effect of helium addition to the Ðе/SF6/H2 mixture on the SF6 and H2 dissociation degree, nitride and silicon dioxide ...
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