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Barrier‐Assisted Plasma Doping for Spatially Selective Resistance Engineering in MoS2 Transistors
Barrier‐assisted NH3 plasma doping enables damage‐free, spatially selective carrier modulation in monolayer MoS2 transistors. An ultrathin pV3D3/Al2O3 protective‐dielectric stack acts as a chemical filter that allows NHx radicals to reach the MoS2 surface while blocking plasma damage. This process achieves a high electron concentration of 4.3 × 1013 cm−
Inseong Lee +15 more
wiley +1 more source
Design, Synthesis, and Evaluation of β‑Lactamase Inhibitors as Potential Therapeutics for Antimicrobial Resistance. [PDF]
Batool S, Farid R, Azam SS, Hassan A.
europepmc +1 more source
Genome Assembly Revealed MdZAT5 Coordinates Anthocyanin Biosynthesis in Apple Fruit Peel and Flesh by Interacting With MdHY5. [PDF]
Zhao M +8 more
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Zinc dynamics in the pluripotent stem cells during maintenance of pluripotency and pancreatic differentiation. [PDF]
Shiraki N +8 more
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Proceedings of the International Conference and Workshop on Emerging Trends in Technology, 2010
Since the beginning of this millennium, there has been an unprecedented growth in broadband wireless networks. This can be attributed to high demand for wireless multimedia services such as data, voice, video, and the development of new wireless standards.
Mukesh Singh, Shilp Dixit
openaire +1 more source
Since the beginning of this millennium, there has been an unprecedented growth in broadband wireless networks. This can be attributed to high demand for wireless multimedia services such as data, voice, video, and the development of new wireless standards.
Mukesh Singh, Shilp Dixit
openaire +1 more source

