Results 101 to 110 of about 437,703 (216)

Additive Gaussian Process Regression for Predictive Design of High‐Performance, Printable Silicones

open access: yesAdvanced Engineering Materials, EarlyView.
A chemistry‐aware design framework for tuning printable polydimethylsiloxane (PDMS) for vat photopolymerization (VPP) is developed using additive Gaussian process (GP) modeling. Polymer network mechanics informs variable groupings, feasible formulation constraints, and interaction variables.
Roxana Carbonell   +3 more
wiley   +1 more source

Nonvolatile photonic field-programmable coupler array. [PDF]

open access: yesSci Adv
Toftevaag HH   +4 more
europepmc   +1 more source

Tailored Hierarchical Porous Copper Architectures via Three Dimensional Printing and Pressure‐less Sintering for Next‐Generation Lithium‐Metal Batteries

open access: yesAdvanced Engineering Materials, EarlyView.
A hierarchical porous copper current collector is fabricated via three‐dimensional printing combined with pressureless sintering to stabilize lithium metal anodes. The interconnected architecture lowers local current density, guides uniform Li deposition within pores, and suppresses dendrite growth.
Alok Kumar Mishra, Mukul Shukla
wiley   +1 more source

Al–Cu Composite Casting of Laser‐Deoxidized Copper: Bonding, Interfacial Chemistry, and Thermal Conductivity

open access: yesAdvanced Engineering Materials, EarlyView.
This study investigates laser‐based oxide removal of Cu inserts in oxygen‐free conditions and examines long‐term oxidation kinetics and surface chemistry under different atmospheres via X‐ray photoelectron spectroscopy. Al–Cu compound casting with differently oxidized surfaces is performed, and intermetallic phase formation, morphology, and thermal ...
Timon Steinhoff   +9 more
wiley   +1 more source

Nonthermal Plasma Reduction of Nickel Oxide Layers by Atmospheric Pressure Dielectric Barrier Discharge in Argon/Hydrogen

open access: yesAdvanced Engineering Materials, EarlyView.
This work explores the reduction of nickel oxide layers using dielectric barrier discharge plasma in an argon–hydrogen atmosphere. The results reveal a strong temperature dependence, enabling complete reduction of thick oxide layers at 200°C within seconds.
Maria Argirusi   +5 more
wiley   +1 more source

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