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Evolution as applied to optical lithography
SPIE Proceedings, 2007The recent advancement of water immersion technology into lithography for 193nm wavelengths has allowed the numerical aperture (NA) of lithographic lenses to exceed 1.0 or a hyper-NA region. This allows resolution limits to extend to the 45nm node and beyond with NA>1.35.
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Applied Problems of Digital Optics
1986Publisher Summary This chapter discusses the most important problems of applied digital optics, including those of adaptation and of continuity and discreteness in processing pictures and other optical signals. It deals with methods for correction of linear and nonlinear distortions of signals in display and holographic systems and with noise ...
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Transformation optics applied to van der Waals interactions
, 2016R. Zhao, Yu Luo, J. Pendry
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Geometrical-optics analysis of reflective glass beads applied to building coatings
, 2015Jihui Yuan, K. Emura, C. Farnham
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