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Evolution as applied to optical lithography

SPIE Proceedings, 2007
The recent advancement of water immersion technology into lithography for 193nm wavelengths has allowed the numerical aperture (NA) of lithographic lenses to exceed 1.0 or a hyper-NA region. This allows resolution limits to extend to the 45nm node and beyond with NA>1.35.
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Applied Problems of Digital Optics

1986
Publisher Summary This chapter discusses the most important problems of applied digital optics, including those of adaptation and of continuity and discreteness in processing pictures and other optical signals. It deals with methods for correction of linear and nonlinear distortions of signals in display and holographic systems and with noise ...
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Applied Optical Principles

International Ophthalmology Clinics, 1971
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Applying optical systems

2004
M. Edwards, G. Doménech-Asensi
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