Silicon‐Integrated Next‐Generation Plasmonic Devices for Energy‐Efficient Semiconductor Applications
Silicon (Si)‐integrated plasmonics offer a pathway to next‐generation, energy‐efficient semiconductor applications. This review highlights advances using complementary metal–oxide–semiconductor (CMOS)‐compatible materials like transparent conductive oxides and novel architectures, particularly coupled hybrid plasmonic waveguides (CHPWs).
Nasir Alfaraj, Amr S. Helmy
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Feasibility of Utilizing Spot-Scanning Proton Arc (SPArc) for Whole-Lung Irradiation: A Case Report. [PDF]
Liu P+9 more
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Optimization of amorphous silicon solar cells through photonic crystals for enhanced optical properties. [PDF]
Sayed H+4 more
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Correction: The evolution of bone-eating worm diversity in the Upper Cretaceous Chalk Group of the United Kingdom. [PDF]
Jamison-Todd S+6 more
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Comparison of Advanced Dynamic Arc Therapy With Collimator Rotation and Fixed Integrated Gantry Positions to the Standard of Care Across Five Treatment Sites. [PDF]
Clark R+5 more
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Design of Space Target Surveillance Constellation Based on Simulation Comparison Method. [PDF]
Hu Q, Liu D, Dong Z.
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Investigation of laser factors influence on strength of laser spot welding of 316 stainless steel using the designing experiments method. [PDF]
Hadavi M+4 more
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The Geometry of Arc Interruption
Transactions of the American Institute of Electrical Engineers, 1941It is the purpose of this paper to present a rigorous analysis and description of the phenomenon which takes place in an interrupting device during the interval between the parting of the contacts and the current zero at which interruption takes place.
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The effect of cathode geometry on the stability of arcs
Journal of Physics D: Applied Physics, 1969A new technique is presented for stabilizing free-burning d. c. arcs between graphite electrodes in the current range 400-2000 A. The stability of the arcs is shown to be critically dependent on the cathode geometry, and the possible factors influencing the motion of the arc are discussed.
C M H Sharp, R W Montgomery
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