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Barrier‐Assisted Plasma Doping for Spatially Selective Resistance Engineering in MoS2 Transistors

open access: yesAdvanced Materials, EarlyView.
Barrier‐assisted NH3 plasma doping enables damage‐free, spatially selective carrier modulation in monolayer MoS2 transistors. An ultrathin pV3D3/Al2O3 protective‐dielectric stack acts as a chemical filter that allows NHx radicals to reach the MoS2 surface while blocking plasma damage. This process achieves a high electron concentration of 4.3 × 1013 cm−
Inseong Lee   +15 more
wiley   +1 more source

Architectural Styles as a Guide for Software Architecture Reconstruction

Communications in Computer and Information Science, 2008
Much effort has been put in defining methods, techniques, and tools for software architecture reconstruction (SAR) Software Architecture Transformation (SAT), and Software Architecture-based Development, but much less attention has been paid to what lies at the heart of architecture-based development, software architectural styles.
Ali Kamandi, Habibi Jafar
exaly   +2 more sources

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