Results 331 to 340 of about 575,100 (391)
Some of the next articles are maybe not open access.
Scaled indium oxide transistors fabricated using atomic layer deposition
Nature Electronics, 2022To continue to improve integrated circuit performance and functionality, scaled transistors with short channel lengths and low thickness are needed. But further scaling of silicon-based devices and the development of alternative semiconductor channel ...
M. Si +5 more
semanticscholar +1 more source
Atomic Layer Deposition Beyond Thin Film Deposition Technology
Advanced Materials & Technologies, 2022Atomic layer deposition (ALD) is well known as the most advanced coating technique so far due to its unique deposition characteristics, such as uniformity and 3D conformality.
Sumaira Yasmeen +3 more
semanticscholar +1 more source
Recent Advances in Materials Design Using Atomic Layer Deposition for Energy Applications
Advanced Functional Materials, 2021The design and development of materials at the nanoscale has enabled efficient, cutting‐edge renewable energy storage, and conversion devices such as solar cells, water splitting, fuel cells, batteries, and supercapacitors.
Bikesh Gupta +9 more
semanticscholar +1 more source
Semiconductor Science and Technology, 2012
The growth method of atomic layer deposition (ALD) was introduced in Finland by Suntola under the name of atomic layer epitaxy (ALE). The method was originally used for deposition of thin films of sulphides (ZnS, CaS, SrS) activated with manganese or rare-earth ions.
Antonio Aliano +43 more
+4 more sources
The growth method of atomic layer deposition (ALD) was introduced in Finland by Suntola under the name of atomic layer epitaxy (ALE). The method was originally used for deposition of thin films of sulphides (ZnS, CaS, SrS) activated with manganese or rare-earth ions.
Antonio Aliano +43 more
+4 more sources
2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443), 2002
The current status of ALD technology will be reviewed. In addition, engineered nanolaminate or alloy films of both dielectric and metal materials will be demonstrated and their applications discussed.
Mikko Ritala, Markku Leskelä
openaire +2 more sources
The current status of ALD technology will be reviewed. In addition, engineered nanolaminate or alloy films of both dielectric and metal materials will be demonstrated and their applications discussed.
Mikko Ritala, Markku Leskelä
openaire +2 more sources
2015
Atomic layer deposition (ALD), also referred to historically as atomic layer epitaxy, is a vapor-phase deposition technique for preparing ultra-thin films with precise growth control. ALD is currently rapidly evolving, mostly driven by the continuous trend in the miniaturization of electronic devices. In addition, many other innovative technologies are
Knoops, H.C.M. +3 more
openaire +2 more sources
Atomic layer deposition (ALD), also referred to historically as atomic layer epitaxy, is a vapor-phase deposition technique for preparing ultra-thin films with precise growth control. ALD is currently rapidly evolving, mostly driven by the continuous trend in the miniaturization of electronic devices. In addition, many other innovative technologies are
Knoops, H.C.M. +3 more
openaire +2 more sources
JOT Journal für Oberflächentechnik, 2011
A method of depositing a material on a substrate using an atomic layer deposition process, wherein the deposition process comprises a first deposition step, a second deposition step subsequent to the first deposition step, and a delay of at least one minute between the first deposition step and the second deposition step. Each deposition step comprises
Bernd Szyszka, Hugo Tholense
openaire +2 more sources
A method of depositing a material on a substrate using an atomic layer deposition process, wherein the deposition process comprises a first deposition step, a second deposition step subsequent to the first deposition step, and a delay of at least one minute between the first deposition step and the second deposition step. Each deposition step comprises
Bernd Szyszka, Hugo Tholense
openaire +2 more sources
Inherently Selective Atomic Layer Deposition and Applications
Chemistry of Materials, 2020The chemical approaches enabling selective atomic layer deposition (ALD) are gaining growing interest.
K. Cao, Jiaming Cai, Rong Chen
semanticscholar +1 more source