Results 341 to 350 of about 575,100 (391)

Polyphenol‐Sensitized Atomic Layer Deposition for Membrane Interface Hydrophilization

Advanced Functional Materials, 2020
Improvements in energy–water systems will necessitate fabrication of high‐performance separation membranes. To this end, interface engineering is a powerful tool for tailoring properties, and atomic layer deposition (ALD) has recently emerged as a ...
Xiaobin Yang, Pan Sun, Huiru Zhang, Zijing Xia, Ruben Z. Waldman, A. Mane, J. Elam, L. Shao, S. Darling   +8 more
semanticscholar   +1 more source

Long-term stability in perovskite solar cells through atomic layer deposition of tin oxide

Science
Robust contact schemes that boost stability and simplify the production process are needed for perovskite solar cells (PSCs). We codeposited perovskite and hole-selective contact while protecting the perovskite to enable deposition of SnOx/Ag without the
Danpeng Gao, Bo Li, Qi Liu, Chunlei Zhang, Zexin Yu, Shuai Li, Jianqiu Gong, Liangchen Qian, Francesco Vanin, Kelly Schutt, Melissa A. Davis, A. Palmstrom, S. Harvey, Nicholas J. Long, Joseph M. Luther, X. Zeng, Zonglong Zhu   +16 more
semanticscholar   +1 more source

Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 Using Ethanethiol Inhibitor

, 2020
Area-selective atomic layer deposition (AS-ALD) is a promising bottom-up patterning approach for fabricating conformal thin films.
Hyun Gu Kim, Miso Kim, B. Gu, M. R. Khan, Byeong Guk Ko, Sumaira Yasmeen, Chang Su Kim, Se-hun Kwon, Jiyong Kim, J. Kwon, K. Jin, Byungchul Cho, Jinsung Chun, Bonggeun Shong, Han‐Bo‐Ram Lee   +14 more
semanticscholar   +1 more source

Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru

Chemistry of Materials, 2019
Area-selective atomic layer deposition (AS-ALD) is a promising “bottom-up” alternative to current nanopatterning techniques.
Dara Bobb-Semple, Katie L. Nardi, Nerissa Draeger, D. Hausmann, S. Bent   +4 more
semanticscholar   +1 more source

Novel materials by atomic layer deposition and molecular layer deposition

MRS Bulletin, 2011
Abstract
Markku Leskelä, Mikko Ritala, Ola Nilsen   +2 more
openaire   +1 more source

Atomic Layer Deposition

2017
Over the course of this semester understanding of the theory and application of Atomic Layer Deposition [ALD] was pursued, all in preparation for further research focusing on the charge carrier type, density, and mobility in ultrathin film ZnO. At the beginning of the semester a wide array of scientific articles was read in order to build up a basic ...
Pannock, Daniel, Banerjee, Parag
openaire   +2 more sources

Electroless Atomic Layer Deposition

ECS Meeting Abstracts, 2014
Atomic layer deposition (ALD) is a group of methods for the formation of nanofilms of materials, an atomic layer at a time using surface limited reactions. The majority of those methods are based on use of the vacuum environment. However there are methods such as sequential ionic layer adsorption reaction (SILAR) which used the condensed phase, that ...
John Lewellen Stickney, David M. Benson, Kaushik Jagannathan, David B. Robinson   +3 more
openaire   +1 more source

Opportunities for Atomic Layer Deposition in Emerging Energy Technologies

ACS Energy Letters, 2019
The demand for new and more efficient energy technologies has motivated the need to design and construct materials at the nanoscale. Because it allows for the synthesis of materials with atomic-level control over nanostructure and composition, atomic ...
Arun S. Asundi, James A. Raiford, S. Bent   +2 more
semanticscholar   +1 more source

Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review

Chemistry of Materials, 2018
In the past decade, atomic layer deposition (ALD) has become an important thin film deposition technique for applications in nanoelectronics, catalysis, and other areas due to its high conformality...
A. Mackus, J. R. Schneider, Callisto MacIsaac, J. Baker, S. Bent   +4 more
semanticscholar   +1 more source

Complex Materials by Atomic Layer Deposition

Advanced Materials, 2015
Complex materials are defined as nanostructured materials with combinations of structure and/or composition that lead to performance surpassing the sum of their individual components. There are many methods that can create complex materials; however, atomic layer deposition (ALD) is uniquely suited to control composition and structural parameters at ...
Adam M, Schwartzberg, Deirdre, Olynick
openaire   +2 more sources