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Plasma atomic layer deposition
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time during an excited species phase, wherein activated reactant is supplied such as from a plasma. Reduced residence time increases the quality of the deposited layer, such as reducing wet etch rates, increasing index of refraction and/or reducing impurities in ...Knoops, H.C.M. +2 more
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Quantum metrology with nonclassical states of atomic ensembles
Reviews of Modern Physics, 2018Augusto Smerzi +2 more
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2016 14th International Baltic Conference on Atomic Layer Deposition (BALD), 2016
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Quantum repeaters based on atomic ensembles and linear optics
Reviews of Modern Physics, 2011Nicolas Sangouard +2 more
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Atomic-Scale Imaging and Spectroscopy of Electroluminescence at Molecular Interfaces
Chemical Reviews, 2017Klaus Kuhnke +2 more
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