Photonic Hybrid Integration: Strategies and Promises of Advanced Additive Manufacturing
Heterogeneous photonic integration combines wafer bonding, transfer printing, and advanced multi‐photon lithography to realize compact, adaptable photonic systems. This review highlights breakthroughs in hybrid materials, metrology, and 4D printing, revealing how the convergence of traditional and emerging fabrication unlocks scalable, high‐performance
Zhitian Shi +3 more
wiley +1 more source
On-chip quantum states generation by incoherent light. [PDF]
Song YW +11 more
europepmc +1 more source
MFQ: Network Bandwidth Utilization among Data Centers on Software Defi ned Network Using Multilevel-Feedback Queue [PDF]
R. Shanthy +2 more
openalex +1 more source
Benchmarking Organic Photodiodes at the Noise Floor
A precise measurement framework based on a calibrated, ultra‐low‐noise automated setup with open‐source Python scripts enables accurate benchmarking of photodiodes. The unique combination of time‐dependent current measurement under dark conditions, followed by continuous‐wave faint illumination, facilitates reliable extraction of photocurrent near ...
Siddhartha Saggar +2 more
wiley +1 more source
Improved multi-strategy secretary bird optimization for efficient IoT task scheduling in fog cloud computing. [PDF]
Sangeetha K, Kanthimathi M.
europepmc +1 more source
A Review on Bandwidth Utilization for Bursty Traffic in Asynchronous Transfer Mode Networks
T. Anuradha, A. Renuka Devi
openalex +1 more source
Ultra‐Durable Information‐Encoded Anti‐Counterfeiting Self‐Assembled Nanocrystal Labels
Ultra‐durable cost‐effective information‐encoded anti‐counterfeiting labels are fabricated to secure semiconductor chips. A novel method is used to self‐assemble colloidal quantum wells (CQWs) into color bars. Information can be encoded spatially, spectrally, and opto‐spatially.
Taha Haddadifam +6 more
wiley +1 more source
Evaluation and optimization of resource matching for perception services in power communication networks. [PDF]
Wei L, Shang L, Zhang M, Li H, Zhu X.
europepmc +1 more source
Modeling and Improving Geometric Accuracy in Projection Multiphoton Lithography
A numerical framework describing the optical and photochemical processes is developed to elucidate the origins of geometric deviations in projection multiphoton lithography. The results indicate that oxygen diffusion and inhibition, and DMD diffraction, lead to geometric distortions.
Anwarul Islam Akash +2 more
wiley +1 more source

