Results 181 to 190 of about 276,966 (307)

Enamel Integrity and Residual Composite Following Clear Aligner Attachment Removal: A Systematic Review. [PDF]

open access: yesClin Pract
Nassar N   +5 more
europepmc   +1 more source

Heterointerface‑Enabled Electrocatalysis for Efficient Energy Conversion

open access: yesAdvanced Science, EarlyView.
Functionally distinct A/B materials can be integrated at the nanoscale to create customized heterointerfaces with tunable band alignment and charge redistribution, providing fast electron and ion transport channels as well as cooperative dual active sites.
Liuru Fang   +3 more
wiley   +1 more source

Highly Robust Sn‐Based MAX Anodes Constructed via Ti6C Octahedral Outer Immobilization and A‐Layer Fe Inner Anchoring for Long‐Life Lithium‐Ion Batteries

open access: yesAdvanced Science, EarlyView.
How can Sn‐based anodes achieve high capacity and long‐life cycling? This work unlocks the potential anode structure by confining Sn in the A layer of MAX phase with Ti6C octahedra as outer immobilization and Fe as inner anchors. The introduction of Fe dramatically strengthens the Ti–Sn bond to enhance structural integrity, modulate interfacial ...
Yu‐ang Lei   +13 more
wiley   +1 more source

Research on the Application of Diamond Film in Chemical Mechanical Polishing. [PDF]

open access: yesNanomaterials (Basel)
Wang Y   +10 more
europepmc   +1 more source

In Situ Polyurea Integration for Self‐Healing, Durable Transparent Electromagnetic‐Interference Shielding Film

open access: yesAdvanced Science, EarlyView.
A steric‐hindrance molecular engineering strategy uses dimethyl maleate (DMM) to convert poly(1,4‐butanediol) bis(4‐aminobenzoate) (PBDAB) into a precursor with reduced reactivity via Michael addition, thereby retarding the curing process to form a transparent, ultraflexible, and self‐healable secondary‑amine polyurea (PuSA) with a crosslinked network.
Sinan Zheng   +10 more
wiley   +1 more source

One‐Step, High‐Removal‐Rate and Low‐Damage Chemical Mechanical Polishing of InP Enabled by Hydrolysis Activated PF6− with In Situ Fluoride Passivation

open access: yesAdvanced Science, EarlyView.
In this work, we propose a CMP method for InP using NH4PF₆, which hydrolyzes under In3+ catalysis to form reactive species. These convert InP into low‐binding‐energy fluorides, facilitating removal and dissolution. The process delivers high material removal rates, smooth surfaces, and fluorine passivation that lowers defect density and improves ...
Shigong Fu   +5 more
wiley   +1 more source

Molecular Dynamics Study on the Mechanical Properties of Bilayer Silicon Carbide. [PDF]

open access: yesNanomaterials (Basel)
Peng Q   +8 more
europepmc   +1 more source

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