Results 231 to 240 of about 10,792 (301)

Variational Thermomechanically Coupled Shape Memory Alloy Material Model and Optimization of Shape Memory Alloy Based Out‐of‐Plane Bistable Microactuator

open access: yesInternational Journal for Numerical Methods in Engineering, Volume 127, Issue 3, 15 February 2026.
ABSTRACT This work presents a fully thermomechanically coupled material model for shape memory alloys (SMAs), capable of predicting shape memory effect, superelasticity, stress and strain recovery, and martensite reorientation. Formulated within the Generalized Standard Material (GSM) framework, the model employs a rate potential, whose variations ...
Muhammad Babar Shamim   +2 more
wiley   +1 more source

A Jacobian‐Free Newton‐Krylov Method for Cell‐Centred Finite Volume Solid Mechanics

open access: yesInternational Journal for Numerical Methods in Engineering, Volume 127, Issue 3, 15 February 2026.
ABSTRACT This study proposes a Jacobian‐free Newton‐Krylov approach for finite‐volume solid mechanics. Traditional Newton‐based approaches require explicit Jacobian matrix formation and storage, which can be computationally expensive and memory‐intensive.
Philip Cardiff   +3 more
wiley   +1 more source

Tailored Xenogeneic‐Free Polymer Surface Promotes Dynamic Migration of Intestinal Stem Cells

open access: yesAdvanced Materials, Volume 38, Issue 8, 6 February 2026.
This study introduces a PoLymer‐coated Ultra‐stable Surface (PLUS), a nitrogen plasma‐treated poly(ethyleneglycoldimethacrylate), as a stable xenogeneic‐free platform for intestinal stem cell culture. PLUS enhances cell attachment, supports actin‐driven migration, and retains functionality after 3 years of storage. Promoting cytoskeletal reorganization,
Seonghyeon Park   +13 more
wiley   +1 more source

Molecular Layer Deposited Aluminum‐Based Hybrid Resist for High‐Resolution Nanolithography and Direct Ultra‐High Aspect Ratio Pattern Transfer

open access: yesAdvanced Materials Technologies, Volume 11, Issue 3, 5 February 2026.
This study demonstrates an aluminum‐based hybrid photoresist synthesized via molecular layer deposition (MLD) using trimethylaluminum and hydroquinone. The resist achieves sub‐20 nm resolution and virtually infinite silicon etch selectivity, enabling 40 nm‐wide, micrometer‐tall nanostructures.
Won‐Il Lee   +8 more
wiley   +1 more source

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