This review comprehensively evaluates extrusion‐based additive manufacturing for advanced ceramics, detailing feedstock options and key process parameters. By critically addressing defect mechanisms like porosity and cracking, the work highlights optimization strategies through machine learning and advanced postprocessing.
Meisam Bakhtiari +4 more
wiley +1 more source
Selected Deposition Techniques and the Effect of Doping on the Properties of Thin ZnO Films: A Literature Review. [PDF]
Polis J +4 more
europepmc +1 more source
High‐Resolution Corrosion Fingerprinting of Alloy Libraries via Microdroplet Spectroelectrochemistry
Ionic‐liquid microdroplet spectroelectrochemistry enables stable, localized electrochemical measurements over extended timescales. By coupling impedance spectroscopy, wetting analysis, finite‐element simulations, and operando Raman spectroscopy, it disentangles geometrical and electrochemical effects, opening new opportunities for rapid corrosion ...
Ekaterina Kurchavova +3 more
wiley +1 more source
Controllable Preparation of Large-Area Ordered MoS<sub>2</sub> Nanotube Arrays with Enhanced Optoelectronic Detection Performance. [PDF]
Lin H +7 more
europepmc +1 more source
Multilayer Self‐Limiting Electrospray Deposition via Stepped Voltage Bias
Self‐limiting electrospray deposition (SLED) uses a high voltage to generate and deposit a charged payload on a target surface. The coating retains its charge, repelling newly arriving material. SLED thickness can be decreased by applying a secondary bias to the target.
Madhuri Deb +3 more
wiley +1 more source
Recent efforts of vapour-phase strategies for EUV resist toward high- and hyper-NA extreme ultraviolet lithography. [PDF]
Chu TTH +13 more
europepmc +1 more source
Postbuild annealing systematically modifies the phase fractions and morphology of EB‐PBF processed Mo–9Si–8B. Quantitative microstructure–property correlations reveal how controlled phase evolution enhances high‐temperature compressive strength and creep resistance.
Christopher Schmidt +5 more
wiley +1 more source
Uniform TiN-Capped Co Buried Bit Lines for 4F<sup>2</sup> DRAM Vertical Channel Transistors: Mitigating Agglomeration with Co Nitridation. [PDF]
Sun J +6 more
europepmc +1 more source
Deep‐UV (258 nm) femtosecond pulses enable uniform amorphous silicon writing on Si(100)/(111) with a six‐fold larger fluence amorphization window than NIR methods. Optimized fluence and overlap yield 20–45 nm uniform and continuous amorphous layers. Microscopy shows sharp interfaces, and real‐time reflectivity reveals nanosecond melt–resolidification ...
Wissal Benali +5 more
wiley +1 more source
Advanced Design of Three-Dimensional Lithiophilic Carbon-Based Hosts for Anode-Free Lithium Metal Batteries. [PDF]
Yang F +9 more
europepmc +1 more source

