Results 181 to 190 of about 14,035 (212)
Patterning Fidelity Enhancement and Aberration Mitigation in EUV Lithography Through Source-Mask Optimization. [PDF]
Wang Q, Wu Q, Li Y, Liu X, Li Y.
europepmc +1 more source
The relativistic coma aberration. II. Helmholtz wave optics
Natig M. Atakishiyev +2 more
openalex +1 more source
The relativistic coma aberration. I. Geometrical optics
Natig M. Atakishiyev +2 more
openalex +1 more source

