Results 121 to 130 of about 621,353 (193)

Electronic Structure of Si-based Superlattice Ⅵ(A)/Si_6/SiO_2/Si_6/Ⅵ(A)

open access: yes, 2007
【中文摘要】 硅的有效光发射是硅基光电器件研究的一个关键问题,因此一直受到广泛的关注.本文采用第一性原理对新的硅基材料Ⅵ(A)/Sim/SiO2/Sim/Ⅵ(A)(m=6,Ⅵ(A)=O,Se)的能带结构、态密度和电荷密度等进行了计算研究.通过改变掺入Ⅵ(A)族原子氧和硒的对比,分析了SiO2层、不同的Ⅵ(A)族原子以及它们与最近邻Si原子的相互作用对硅基材料电子性质的影响.研究表明,在局域密度近似(LDA)下,O/Si6/SiO2/Si6/O结构在X点存在准直接带隙的特征,而Se/Si6/SiO2 ...
黄美纯, 陈捷
core  

High‐Efficiency Deep Blue Single‐Gaussian Europium(II) Emitters and Their Emitter‐Host Interactions

open access: yesAdvanced Functional Materials, EarlyView.
Crown‐ether ligands and carborate anions enable vacuum‐processable Eu(II) emitters with efficient single‐Gaussian deep‐blue luminescence. Combined photophysical and computational analyses reveal that excited‐electron confinement and steric shielding of the europium center jointly govern compatibility with OLED host materials, establishing molecular ...
Mahmoud Soleimani   +8 more
wiley   +1 more source

An Integrated Oxygen‐Supplying Device and Predictive Multiphysics Model for Extended Ambient Transport of Insulin‐Producing Cells

open access: yesAdvanced Functional Materials, EarlyView.
Cell therapies typically rely on cold‐chain logistics and cryopreservation, limiting access and compromising cell quality. Here, a dual‐chamber device separates an oxygen‐supplying chamber from a hyaluronic acid cargo chamber, sustaining oxygen delivery for over 70 h and enabling ambient‐temperature shipment.
Daniel A. Domingo‐Lopez   +9 more
wiley   +1 more source

Development of Advanced Creep Damage Constitutive Equations for Low CR Alloy Under Long-Term Service [PDF]

open access: yes
Low Cr alloys are mostly utilized in structural components such as steam pipes, turbine generators and reactor pumps operating at high temperatures from 400℃ to 700℃ in nuclear power plants.
Xu, Qihua
core  

Enhanced Ferroelectric Phase Formation via Local Structure Modification in the Pre‐Crystalline State of Hafnium Zirconium Oxide Thin Films

open access: yesAdvanced Functional Materials, EarlyView.
Hafnium zirconium oxide thin films are grown using plasma‐enhanced atomic layer deposition with the addition of an atomic layer annealing (ALA) step. ALA leads to a change in the short‐range structure of the deposit and encourages formation of the ferroelectric Pca21 phase. The result is wake‐up‐free performance with films exposed to ALA.
Nicolas K. Lam   +18 more
wiley   +1 more source

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