Results 101 to 110 of about 341,628 (112)
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High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope–based contours in next-generation lithography

Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2011
Peter De Bisschop   +2 more
exaly  

Proximity effect correction in electron-beam lithography based on computation of critical-development time with swarm intelligence

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2017
Chao-Hsin Wu   +2 more
exaly  

Aerial image slope and proximity effects on critical dimensions in mask lithography

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1998
exaly  

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