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Diabetes Mellitus, Cumulative Glucose Exposure, and Incident Cardiovascular Disease Risk. [PDF]
JACC AdvDomanski MJ +12 more
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Positive Predictive Value of Universal Cardiovascular Disease Risk Assessment for Pregnant and Postpartum Patients. [PDF]
JACC AdvWolfe DS +8 more
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TiN-CVD process optimization for integration with Cu-CVD
Microelectronic Engineering, 2000Abstract Integration of Cu-CVD as metallization for on-chip interconnect requires an efficient barrier to avoid any Cu diffusion in the insulating material. These barriers must also promote adhesion of Cu to the inter- and intra-metal level material, and have low resistivity to minimize level to level contact resistance.
M Juhel, P Motte, Y Morand
exaly +2 more sources
2021
??????????. ?????????????????? ????????????????????, ???????? ???????????????????????????? ???? ???????????????????????????? ?????????????????????????? ??????????????, ?????????????? ???????????????????? ?????????????????? ?????? ???????????????????? ???????????????????? ???????????????? ???????????????????????????? ???????????????? ?????????????? ?????
openaire +2 more sources
??????????. ?????????????????? ????????????????????, ???????? ???????????????????????????? ???? ???????????????????????????? ?????????????????????????? ??????????????, ?????????????? ???????????????????? ?????????????????? ?????? ???????????????????? ???????????????????? ???????????????? ???????????????????????????? ???????????????? ?????????????? ?????
openaire +2 more sources
1998
Instead of using thermal energy for decomposition and chemical reaction of the source gas, plasma CVD uses the glow discharge in non-equilibrium plasma to ionize and excite the source gas and generate ions and radicals. Plasma CVD utilizes their reactiveness for depositing thin films.
openaire +1 more source
Instead of using thermal energy for decomposition and chemical reaction of the source gas, plasma CVD uses the glow discharge in non-equilibrium plasma to ionize and excite the source gas and generate ions and radicals. Plasma CVD utilizes their reactiveness for depositing thin films.
openaire +1 more source
1998
Deep contact hole and through-hole filling techniques are becoming the most important technology with the decreasing feature size of ULSI devices. The filling technique for deeper and smaller contact holes is becoming a more critical technology because of global planarization using CMP and capacity reduction requirements. Therefore the PVD (sputtering)
openaire +1 more source
Deep contact hole and through-hole filling techniques are becoming the most important technology with the decreasing feature size of ULSI devices. The filling technique for deeper and smaller contact holes is becoming a more critical technology because of global planarization using CMP and capacity reduction requirements. Therefore the PVD (sputtering)
openaire +1 more source
2014
?? ?????????? ???????????? ???????????????????????? ???????????????????? ???? ????????????????-???????????????????????????????????? ???????????????????????? ?????? ???????????? ?? ?????????????? ???????????????????????? ?????????????????????? CVD ???????????? ?????? ?????????????????? ???????????????????????????????? ???????????????? ?????????????? ????
openaire +3 more sources
?? ?????????? ???????????? ???????????????????????? ???????????????????? ???? ????????????????-???????????????????????????????????? ???????????????????????? ?????? ???????????? ?? ?????????????? ???????????????????????? ?????????????????????? CVD ???????????? ?????? ?????????????????? ???????????????????????????????? ???????????????? ?????????????? ????
openaire +3 more sources
2015
Cardiovascular disease (CVD) is the first cause of mortality and morbidity worldwide. It is responsible for 30 % of all deaths, so that more people die annually from CVD than from any other cause, and 10 % of global burden disease. Currently, the vast majority of deaths and disabilities due to CVD take place in low- and middle-income countries.
D'ANDREA, ELVIRA +2 more
openaire +1 more source
Cardiovascular disease (CVD) is the first cause of mortality and morbidity worldwide. It is responsible for 30 % of all deaths, so that more people die annually from CVD than from any other cause, and 10 % of global burden disease. Currently, the vast majority of deaths and disabilities due to CVD take place in low- and middle-income countries.
D'ANDREA, ELVIRA +2 more
openaire +1 more source
Diamond and Related Materials, 2011
Abstract The ability to minimise, control and manipulate defects in CVD diamond has grown rapidly over the last ten years. The application which best illustrates this is probably that of quantum information processing (QIP) or ‘diamond spintronics’.
Markham, M. +6 more
openaire +2 more sources
Abstract The ability to minimise, control and manipulate defects in CVD diamond has grown rapidly over the last ten years. The application which best illustrates this is probably that of quantum information processing (QIP) or ‘diamond spintronics’.
Markham, M. +6 more
openaire +2 more sources
2016
???????????????????? ???????????????? ???????????????????????? ?????????????? ?????????????????????? ?????????? ?? ???????????????? ?????????????? ?? ?????????????? ???????????? ???? ?????????????? ?????????????????? ?????????????????? ???? ???????????????? ?? ?????????????? ?????????????? CVD, ???? ???????????? ???????????????????? ????????????????????
openaire +3 more sources
???????????????????? ???????????????? ???????????????????????? ?????????????? ?????????????????????? ?????????? ?? ???????????????? ?????????????? ?? ?????????????? ???????????? ???? ?????????????? ?????????????????? ?????????????????? ???? ???????????????? ?? ?????????????? ?????????????? CVD, ???? ???????????? ???????????????????? ????????????????????
openaire +3 more sources