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The Czochralski Technique

1993
If the crystal dimension (its radius) R and the crystallization front position relative to the melt-free surface h are regarded as variable parameters in the Czochralski technique, for stability study (1.3) will include (1.39) and (1.48): $$\delta \dot R = {A_{RR}}\delta R = {A_{Rh}}\delta h$$ (2.1) $$\delta \dot h = {A_{^{hR}}}\delta R +
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The Czochralski Method ‐ where we are 90 years after Jan Czochralski’s invention

Crystal Research and Technology, 2007
AbstractThe Czochralski method, i.e. pulling a crystal from the melt, became the most important technology for the production of large semiconductor (Si, GaAs, InP, GaP …) and optical crystals (oxides, CaF2…). The present status is achieved by a profound analysis of the mechanisms of heat and species transport which are relevant for the stability of ...
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CZOCHRALSKI RUBY

1965
O. H. Nestor, H. M. Dess, M. N. Plooster
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Macroscopic Czochralski growth

Journal of Crystal Growth, 1981
A. Van der Hart, W. Uelhoff
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CZOCHRALSKI RUBY

1967
J. C. Smith   +3 more
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Czochralski Technique

2018
Mohan D. Aggarwal, Ashok K. Batra
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Czochralski silicon

IEEE Transactions on Electron Devices, 1984
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