Results 231 to 240 of about 182,466 (287)

Carbon Shell‐Encapsulated PtFe Catalysts in High Temperature Polymer Electrolyte Membrane Fuel Cells: Balancing Molecular Sieving and Diffusion for Enhanced Reactant Access

open access: yesAdvanced Functional Materials, EarlyView.
Scanning electrochemical microscopy reveals reactant diffusion through porous carbon shells to PtFe cores, while the carbon‐encapsulated PtFe enables high‐performance HT‐PEMFC operation by sieving phosphate ions that induce catalyst poisoning. ABSTRACT High‐temperature polymer electrolyte membrane fuel cells (HT‐PEMFCs) operating at 160°C on phosphoric
Myeong‐Geun Kim   +9 more
wiley   +1 more source

Solitary extramedullary plasmacytoma of the nasopharynx: A case report. [PDF]

open access: yesJ Clin Imaging Sci
Huang D, Gigas J, Portanova A, Singh DP.
europepmc   +1 more source

Thermal Conductivity of CdCr<sub>2</sub>Se<sub>4</sub> Ferromagnet at Low Temperatures: Role of Grain Boundaries and Porosity. [PDF]

open access: yesLangmuir
Hejtmánek J   +7 more
europepmc   +1 more source

The Dense Plasma Focus: A Versatile Dense Pinch for Diverse Applications

IEEE Transactions on Plasma Science, 2012
The dense plasma focus (DPF) is a Z-pinch that has been studied for 50 years. Within ten years of its discovery by Fillipov and Fillipova in Russia and Mather in the USA, this dense pinch was scaled up to 2-MA currents and neutron outputs of ~ 1012/pulse.
Mahadevan Krishnan
exaly   +2 more sources

A pulse current generator for dense plasma focus

Journal of Instrumentation, 2021
Abstract A pulse current generator applied in a type of high-yield intense pulsed neutron source, the Dense Plasma Focus (DPF), is designed and developed in this paper. There are three key components in this generator. Each group of capacitors and switches is integrative to meet the DPF's requirements of low circuit inductance.
H. Xi   +4 more
openaire   +1 more source

Dense Plasma Focus Source

2010
With the emergence of EUVL as the chosen technology for next-generation lithography (NGL) systems, significant effort has been spent in developing light sources consistent with the challenging requirements of the scanner manufacturers as well as meeting the aggressive demands of the end users for high-volume manufacturing (HVM).
Igor Fomenkov   +8 more
openaire   +1 more source

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