Results 291 to 300 of about 708,640 (340)
Ultrathin Monatomic Antimony Films by Sacrificial Atomic Layer Deposition for Phase Change Memory
A three‐step sacrificial atomic layer deposition (s‐ALD) process enables wafer‐scale growth of ultrathin and uniform antimony (Sb) thin films. An ultrathin (≈4 nm) Sb film is uniformly deposited with its characteristic bilayer structure (Sb‐Sb) aligned along the substrate.
Gwangsik Jeon +9 more
wiley +1 more source
Observation of Catalytic Variability of Single Enzyme Zeolitic Imidazole Framework‐8 Nanoparticles
A microwell‐based fluorescence method characterizes the catalytic activity of single enzyme zeolitic imidazole framework‐8 (ZIF‐8) nanoparticles (NPs). Horseradish peroxidase (HRP) and bovine serum albumin (BSA) are loaded into ZIF‐8 NPs and reveal subpopulations of catalytic activity at single‐particle resolution.
Melissa C. D'Amaral +2 more
wiley +1 more source
Scalable Etch‐Free Transfer of Low‐Dimensional Materials From Metal Films to Diverse Substrates
A scalable, etch‐free transfer method for low‐dimensional materials is presented, utilizing a low‐melting‐point metal as a reusable support. This technique enables gentle wafer‐scale electrochemical delamination from mechanically fragile metal thin‐film substrates and supports integration into device architectures.
Kentaro Yumigeta +14 more
wiley +1 more source
Fabrication of Ultrathin MoS2 Layers via Interfacial Assembly for Solar Cell Applications
Utilizing a modified interfacial assembly to grow a MoS2 ultrathin film serves as a feasible and accessible strategy for material investigation and device fabrication advancement. This technique offers advantages by addressing conventional issues in solution processing, including material loss, coverage, and homogeneity. A working organic solar cell is
Muntaser Almansoori +7 more
wiley +1 more source
Wet‐Chemical Etching of Silicon Wafer Surfaces Using Aqueous HF‐HBrO3 and HF‐HBrO3‐Br2 Solutions
Aqueous mixtures of HF and HBrO3 are reported as a new NOx‐free etching systems for monocrystalline silicon wafers. Silicon is polished with etching rates up to 10 µm min−1 at room temperature. The addition of Br2 leads to anisotropic etching, thus texturing monocrystalline silicon wafer surfaces with upright pyramids.
Nils Schubert +7 more
wiley +1 more source
Rare, endangered or vulnerable plants and neophytes in a drainage system in Croatia
Nada Hulina
openalex +1 more source
Application of ventsim to low pressure gas drainage and high pressure nitrogen reticulation systems
Roy Moreby
openalex +1 more source

