Results 121 to 130 of about 29,667 (148)
Some of the next articles are maybe not open access.
2009 International Conference on Machine Learning and Cybernetics, 2009
In this paper, we investigate the usage of history information for estimation of distribution algorithm (EDA). In EDA, the distribution is estimated from a set of selected individuals and then the estimated distribution model is used to generate new individuals. It needs large population size to converge to the global optimum. A new algorithm, the high-
null Jin Zeng, null Qing-Sheng Ren
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In this paper, we investigate the usage of history information for estimation of distribution algorithm (EDA). In EDA, the distribution is estimated from a set of selected individuals and then the estimated distribution model is used to generate new individuals. It needs large population size to converge to the global optimum. A new algorithm, the high-
null Jin Zeng, null Qing-Sheng Ren
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Engineering & Technology, 2009
Joe Costello left Cadence Design Systems and the EDA business more than ten years ago, but now he's back with Orb Networks. E&T finds out what he has to say to today's design industry.
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Joe Costello left Cadence Design Systems and the EDA business more than ten years ago, but now he's back with Orb Networks. E&T finds out what he has to say to today's design industry.
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Elektrodermale Aktivität (EDA)
1984Unter den von Psychophysiologen verwendeten Biosignalen ist die hautelektrische Aktivitat wohl am starksten verbreitet. Werden die methodischen Probleme bei der Erfassung beherrscht, so konnen gerade Kennwerte des Herz-Kreislauf-Systems durch EDA-Variable sinnvoll erganzt werden, da hautelektrische Veranderungen besonders gut phasische ...
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Proceedings of the 2006 conference on Asia South Pacific design automation - ASP-DAC '06, 2006
As stated in the introduction to the Open Access session, rapid IC technology advances towards deep sub-micron technologies produce ever growing pressure on EDA Vendors. This is evident when examining the requirements to support 65nm and 45nm IC technologies and beyond. The reason is simple.
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As stated in the introduction to the Open Access session, rapid IC technology advances towards deep sub-micron technologies produce ever growing pressure on EDA Vendors. This is evident when examining the requirements to support 65nm and 45nm IC technologies and beyond. The reason is simple.
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Sixth International Symposium on Quality of Electronic Design (ISQED'05), 2005
Summary form only given. Quality has many definitions: conformance to specifications; customer satisfaction; delivery divided by expectations; etc. EDA's sense of quality is determined by what its customers want. Do we have a virtuous cycle in the quality relationship between EDA and its customers?
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Summary form only given. Quality has many definitions: conformance to specifications; customer satisfaction; delivery divided by expectations; etc. EDA's sense of quality is determined by what its customers want. Do we have a virtuous cycle in the quality relationship between EDA and its customers?
openaire +1 more source