Results 31 to 40 of about 958,796 (297)

The fabrication of Ti3C2 and Ti3CN MXenes by electrochemical etching

open access: yesJournal of Materials Chemistry A
2D MXenes are well-known for their outstanding performance in electrochemical energy storage and many other applications owing to their high conductivity and specific surface area.
Kai Chio Chan   +9 more
semanticscholar   +1 more source

An Analysis and Research on the Transmission Ratio of Dye Sensitized Solar Cell Photoelectrodes by Using Different Etching Process

open access: yesInternational Journal of Photoenergy, 2013
Classical photoelectrodes for Dye Sensitized Solar Cells (DSSCs) were fabricated by using the electrochemical method on the titanium (Ti) template, for that the fabrication process would influence the characteristics of the DSSCs. In this study, at first
Chin-Guo Kuo   +6 more
doaj   +1 more source

Wettability of Micro and Nanostructured Surface of Titanium Based Electrodes: Influence of Chemical and Electrochemical Etching

open access: yesChemical Engineering Transactions, 2021
The present work investigates the effects of different surface micro- and nanostructures on electrode morphology, wettability, and electrochemical performance. In their preparation, different etching agents have been used and compared. The nanostructures
Giovanni Sotgiu   +4 more
doaj   +1 more source

Study of porous silicon behavior via neutron irradiation: Fabrication and characterization

open access: yesResults in Physics, 2019
In this project we fabricated and characterized porous silicon (p-type) using an electrochemical etching method for different etching times. We used a UV–VIS spectrophotometer, XPS spectra and (I-V) measurements to characterize and analyze the PSi ...
Ghazwan Ghazi Ali   +3 more
doaj   +1 more source

An Investigation of Electrical Properties of (p-n) Porous Silicon Layer [PDF]

open access: yesEngineering and Technology Journal, 2013
In this work, we studied the electrical properties of (p-n) porous silicon layer under different etching time. The (p-n) porous silicon layer prepared by photo-electrochemical etching process.
Muna Salih Mohammed Jawad   +1 more
doaj   +1 more source

Dislocations as channels for the fabrication of sub-surface porous GaN by electrochemical etching

open access: yesAPL Materials, 2020
Porosification of nitride semiconductors provides a new paradigm for advanced engineering of the properties of optoelectronic materials. Electrochemical etching creates porosity in doped layers while leaving undoped layers undamaged, allowing the ...
F. Massabuau   +6 more
semanticscholar   +1 more source

Porous GaP Multilayers Formed by Electrochemical Etching [PDF]

open access: yesElectrochemical and Solid-State Letters, 2002
The properties of porous GaP, formed by anodic etching in H 2 SO 4 , are described. Pore size, pore density, and the interpore distance depend on the dopant density and the potential at which the sample is etched. In addition, it is shown that at high potential, the GaP passivates as a result of the formation of an oxide layer.
Tjerkstra, R.W.   +3 more
openaire   +4 more sources

Formation of CdO/CdS/textured-ZnO/ZnO heterostructures by chemical deposition

open access: yesФізика і хімія твердого тіла, 2022
CdO/CdS/textured-ZnO/ZnO heterostructure was synthesized using a combination of electrochemical etching and chemical deposition methods. Electrochemical etching was used to form a textured ZnO layer. Chemical deposition of a solution containing CdCl2 was
Yana Suchikova   +4 more
doaj   +1 more source

Planar Solid‐State Nanopores Toward Scalable Nanofluidic Integration Based on CMOS Technology

open access: yesAdvanced Engineering Materials, EarlyView.
We present a scalable silicon‐based fabrication strategy for planar solid‐state nanopores to enable their integration with complex nanofluidic systems. Prototype devices demonstrate normal voltage‐current characteristics, good noise performance, and appreciable streaming currents. Our CMOS‐compatible fabrication process offers precise geometric control
Ngan Hoang Pham   +7 more
wiley   +1 more source

A simple, inexpensive and environmental-friendly electrochemical etching method to fabricate superhydrophobic GH4169 surfaces

open access: yes, 2020
GH4169 is a nickel-based superalloy that has been widely used in aerospace, nuclear energy, petroleum industry and extrusion molds due to its excellent strength, weldability and long-term stability.
Ning Ma   +4 more
semanticscholar   +1 more source

Home - About - Disclaimer - Privacy