Results 111 to 120 of about 81,341 (318)

Transmitted electron exposure in electron beam lithography for double-side patterning of bi-layer metasurfaces on a SiNx membrane

Micro and Nano Engineering
Metasheets, composed of two identical metasurfaces closely aligned to each other within a mode-coupling distance on the two opposite sides of a SiNx membrane, are of unique functionalities for effective modulation of electromagnetic waves by nanoscale ...
Jinyu Guo, Yifei Wang, Hao Quan, Shuoqiu Tian, Qiucheng Chen, Wentao Yuan, Qingxin Wu, Kangping Liu, Yifang Chen, Qiong He, Lei Zhou   +10 more
doaj   +1 more source

Fabrication of Josephson Weak Links Using Electron Beam Lithography and Ion-Etching, and Proposal of a New Single Flux Quantum Logic [PDF]

, 1980
Hirotaka Tamura, Yoichi Okabe, Takuo Sugano   +2 more
openalex   +1 more source

Rolling Ultrasharp Microneedle Spheres Enable Topical Delivery of Biologics Through the Skin

Advanced Healthcare Materials, EarlyView.
Rolling ultraminiaturized microneedle spheres (RUMS), created via two‐photon polymerization, unlock effective and painless topical delivery of messenger RNA (mRNA) and drugs through the skin. By gently forming thousands of microscopic pores, RUMS boost skin permeability by up to 100‐fold.
Theocharis Nikiforos Iordanidis, Argyris Spyrou, Samantha Roudi, Fredrik J. Swartling, Göran Stemme, Samir EL Andaloussi, Niclas Roxhed   +6 more
wiley   +1 more source

Raster-Atomic force nanolithography: New insights towards the fabrication of 3D nanostructures on PMMA and Silicon Nitride

Nano Trends
The rapid advancement of nanoscience has driven significant interest in manipulating materials at the nanoscale, a capability critical to diverse High-tech fields.
Lorenzo Vincenti, Paolo Pellegrino, Isabella Farella, Mariafrancesca Cascione, Valeria De Matteis, Fabio Quaranta, Rosaria Rinaldi   +6 more
doaj   +1 more source

Fabrication of a Highly NO₂-Sensitive Gas Sensor Based on a Defective ZnO Nanofilm and Using Electron Beam Lithography. [PDF]

Micromachines (Basel), 2023
Feng Z, Giubertoni D, Cian A, Valt M, Ardit M, Pedrielli A, Vanzetti L, Fabbri B, Guidi V, Gaiardo A.   +9 more
europepmc   +1 more source

(Y-Er)-Ba-Cu-O superconducting thin films obtained ex-situ: toward submicrometric patterning by electron beam lithography [PDF]

, 1990
P. Cocciolo, M. Gentili, Carlo Giovannella, M. Iannuzzi, L. Luciani, V. Merlo, R. Messi, L. Paoluzi   +7 more
openalex   +1 more source

Structural Control of Photoconductivity in a Flexible Titanium‐Organic Framework

Advanced Materials, EarlyView.
The concept of flexibility is extended to titanium frameworks and use it to gain control over charge transport. MUV‐35 is a flexible doubly interpenetrated framework that can shrink spontaneously its volume by ≈40% to afford a photoconductive, porous state that is thermodynamically favored by non‐covalent interactions. Abstract The soft nature of Metal‐
Clara Chinchilla‐Garzón, Marta Galbiati, Alechania Misturini, Pol Gimeno‐Fonquernie, Neyvis Almora‐Barrios, Natalia M. Padial, Carlos Martí‐Gastaldo   +6 more
wiley   +1 more source

Review of Directed Self-Assembly Material, Processing, and Application in Advanced Lithography and Patterning

Micromachines
Directed self-assembly (DSA) lithography, a cutting-edge technology based on the self-assembly of block copolymers (BCPs), has received significant attention in recent years.
Xiuyan Cheng, Di Liang, Miao Jiang, Yufei Sha, Xiaonan Liu, Jinlai Liu, Qingchen Cao, Jiangliu Shi   +7 more
doaj   +1 more source

Controlled positioning of nanoparticles on a micrometer scale

Beilstein Journal of Nanotechnology, 2012
For many applications it is desirable to have nanoparticles positioned on top of a given substrate well separated from each other and arranged in arrays of a certain geometry.
Fabian Enderle, Oliver Dubbers, Alfred Plettl, Paul Ziemann   +3 more
doaj   +1 more source

A Single-Component Molecular Glass Resist Based on Tetraphenylsilane Derivatives for Electron Beam Lithography. [PDF]

ACS Omega, 2023
Wang Y, Yuan J, Chen J, Zeng Y, Yu T, Guo X, Wang S, Yang G, Li Y.   +8 more
europepmc   +1 more source