Results 151 to 160 of about 21,175 (304)

Field‐Free, Deterministic Giant Spin‐Orbit Torque Switching of 1.3 T Perpendicular Magnetization With Symmetry‐Lifted Topological Surface States

Advanced Materials, EarlyView.
We show a giant, bias‐field free, deterministic, spin‐orbit‐torque switching of perpendicular hard magnets with HC over 1.3 T. By combining the three‐fold 3m symmetry from topological insulator surface states with the rectangular mm2 symmetry from the 2 x 1 intercalation in Cr3Te4, the interface symmetry is significantly reduced into a unidirectional m
He Ren, Yawen Peng, Meixin Cheng, Yu Shi, Reza Asadi, Adam W. Tsen, Guo‐Xing Miao   +6 more
wiley   +1 more source

Optimization of Soft X-Ray Fresnel Zone Plate Fabrication Through Joint Electron Beam Lithography and Cryo-Etching Techniques. [PDF]

Nanomaterials (Basel)
Labani M, Clericò V, Diez E, Gatti G, Amado M, Pérez-Rodríguez A.   +5 more
europepmc   +1 more source

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope. [PDF]

J Vis Exp, 2018
Camino FE, Manfrinato VR, Stein A, Zhang L, Lu M, Stach EA, Black CT.   +6 more
europepmc   +1 more source

Use of electron beam lithography to selectively decompose metalorganics into patterned thin-film superconductors

, 1988
J. V. Mantese, Antonio B. Catalan, Adel Hamdi, Adolph L. Micheli, K. Studer-Rabeler   +4 more
openalex   +2 more sources

Ultrathin Monatomic Antimony Films by Sacrificial Atomic Layer Deposition for Phase Change Memory

Advanced Materials, EarlyView.
A three‐step sacrificial atomic layer deposition (s‐ALD) process enables wafer‐scale growth of ultrathin and uniform antimony (Sb) thin films. An ultrathin (≈4 nm) Sb film is uniformly deposited with its characteristic bilayer structure (Sb‐Sb) aligned along the substrate.
Gwangsik Jeon, Sangmin Jeon, Seunghwan Lee, Jeong Woo Jeon, Wonho Choi, Byongwoo Park, Sungjin Kim, Chanyoung Yoo, Hyejin Jang, Cheol Seong Hwang   +9 more
wiley   +1 more source

Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography. [PDF]

Nat Commun
Tian X, Li F, Tang Z, Wang S, Weng K, Liu D, Lu S, Liu W, Fu Z, Li W, Qiu H, Tu M, Zhang H, Li J.   +13 more
europepmc   +1 more source

Electron-beam lithography for polymer bioMEMS with submicron features. [PDF]

Microsyst Nanoeng, 2016
Scholten K, Meng E.
europepmc   +1 more source

High‐κ Perovskite‐Like Ternary Niobium Oxide Dielectrics for 2D Electronics

Advanced Materials, EarlyView.
High‐κ dielectrics are vital for scaled electronics. Here, a family of 2D high‐κ perovskite‐like ternary niobium oxides is synthesized via a molten salt‐assisted method. Their integration into FETs and logic gates reveals superior switching characteristics, providing a fresh material platform and new insights for the advancement of high‐performance 2D ...
Biao Zhang, Jianmiao Guo, Jianmin Yan, Jialiang Wang, Chao Yun, Guang Zeng, Jie Li, Cong Wang, Zhengdao Xie, Yanglong Hou, Yang Chai   +10 more
wiley   +1 more source

Interfacial Electron Beam Lithography Converts an Insulating Organic Monolayer to a Patterned Single-Layer Conductor with Puzzling Charge Transport Performance. [PDF]

ACS Nano
Maoz R, Nelson P, Gogoi B, Burshtain D, Talukder S, Zou S, Sarkar A, Berson J, Sagiv J.   +8 more
europepmc   +1 more source

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask. [PDF]

J Synchrotron Radiat, 2019
Lin D, Liu Z, Dietrich K, Sokolov A, Sertsu MG, Zhou H, Huo T, Kroker S, Chen H, Qiu K, Xu X, Schäfers F, Liu Y, Kley EB, Hong Y.   +14 more
europepmc   +1 more source