Results 161 to 170 of about 81,341 (318)
Multiple Electron Beam Lithography for High Throughput [PDF]
Sang-Kook Choi, Yi Cheon-Hee
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Bringing Attomolar Detection to the Point‐of‐Care with Nanopatterned DNA Origami Nanoantennas
Single DNA molecules are captured within the hotspots of DNA origami NanoAntennas arranged on a chip surface. Fluorescence is amplified, enabling direct detection on a point‐of‐care‐compatible imaging setup (visualized as bright signals against a dark background).
Renukka Yaadav+13 more
wiley +1 more source
Magnetic hysteresis properties of interacting and noninteracting micron‐sized magnetite produced by electron beam lithography [PDF]
Adrian R. Muxworthy+2 more
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Stimuli‐Responsive Materials for Biomedical Applications
Stimulus‐responsive materials (SRMs) hold great promise for use in a wide range of biomedical applications. This review covers four stimulus modalities, namely, electrical, optical, magnetic, and ultrasound, and their associated SRMs. It provides a summary of the materials in each modality, their development, and current research perspectives.
Adriana Teixeira do Nascimento+8 more
wiley +1 more source
Fabrication of 3D polymer microstructures using electron beam lithography and nanoimprinting technologies [PDF]
Kuo‐Shen Chen, I-K Lin, FH Ko
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Using scanning transmission X‐ray microscopy, nonreciprocal spin‐wave behavior is revealed in real space in Fe/Gd multilayers with perpendicular magnetic anisotropy, highlighting their functionality for magnonic logic circuits operating at GHz frequencies.
Ping Che+12 more
wiley +1 more source
Inverted PAINT for Material‐Specific Super‐Resolution Fluorescence Imaging of Semiconductors
This study presents Inverted PAINT, a label‐free super‐resolution fluorescence imaging method optimized for thick and non‐transparent semiconductor materials. By employing electrostatic dye–surface interactions in an inverted geometry, the technique enables material‐specific, multicolor, and 3D nanoscale imaging, with applications in semiconductor ...
Uidon Jeong, Doory Kim
wiley +1 more source
Fabrication Technology of the Focusing Grating Coupler using Single-step Electron Beam Lithography
Tae‐Youb Kim+8 more
openalex +2 more sources
Electron beam lithography for Nanofabrication
La litografía por haz de electrones (Electron Beam Lithography, EBL) se ha consolidado como una de las técnicas más eficaces que permiten definir motivos en el rango nanométrico. Su implantación ha permitido la nanofabricación de estructuras y dispositivos para su uso en el campo de la nanotecnología y la nanociencia.La EBL se basa en la definición de ...
openaire +1 more source