Results 181 to 190 of about 21,175 (304)

On the thoughput optimalization of electron beam lithography systems

, 1991
E.H. Mulder
openalex   +1 more source

Electron beam lithography on curved or tilted surfaces: Simulations and experiments [PDF]

, 2019
Kerim T. Arat, A.C. Zonnevylle, Wilhelmus S. M. M. Ketelaars, Nikola Belic, Ulrich Hofmann, K. HAGEN   +5 more
openalex   +1 more source

Laser Micromachining of Liquid Metal Patterns for Stretchable Electronic Circuits

Advanced Materials Technologies, EarlyView.
A cleanroom‐free fabrication strategy combines UV‐laser micromachining with a copper foil wetting layer to rapidly produce high resolution, liquid metal based stretchable electronic circuits on diverse substrates. The scalable, maskless process enables complex circuit designs (<$<$3 h, ∼$\sim$15/device) with excellent electrical stability under strain,
Merjen Palvanova, Patrick McManigal, Grace Fredrickson, Eric J. Markvicka   +3 more
wiley   +1 more source

A quantitative comparison between helium ion and electron beam lithography on PMMA resist [PDF]

, 2016
Xiaoqing Shi, Philip D. Prewett, Ejaz Huq, Darren M. Bagnall, Stuart A. Boden   +4 more
openalex  

Femtosecond‐Laser‐Fabricated 3D CYTOP Microfluidic Chips Enabling Super‐Resolution Live Imaging of Cell Behavior in Confined Microspaces

Advanced Materials Technologies, EarlyView.
Using two‐photon polymerization of SU‐8 together with mold processing allowed the creation of defect‐free, flexible 3D microfluidic structures with sub‐micrometer precision in CYTOP. The fabricated CYTOP microfluidic chips enabled super‐resolution imaging of cancer cells in the microchannels, clearly visualizing previously undetectable fine structural ...
Koji Sugioka, Mirai Hanzawa, Kotaro Obata, Sota Matsumoto, Masatoshi Takagi, Asako Sakaue‐Sawano, Asako Tosaki, Satoshi Shimozono, Felix Sima, Hiroyuki Kawano, Takuro Tojima, Daisuke Miyashiro, Kazunari Ozasa, Yasutaka Hanada, Godai Miyaji, Akihiko Nakano, Atsushi Miyawaki   +16 more
wiley   +1 more source

Electron Beam and Soft X-ray Lithography with a Monomolecular Resist

, 2008
Nirmalya Ballav, Chia‐Hao Chen, Michael Zharnikov   +2 more
openalex   +2 more sources

Amido‐Amine Co(II) Precursor‐Based Atomic/Molecular Layer Deposition Processes for Cobalt‐Organic Thin Films and Their Thermal Conversion to CoO Thin Films

Advanced Materials Technologies, EarlyView.
Three new atomic/molecular layer deposition processes are developed for Co‐organic thin films using a promising all‐nitrogen‐coordinated cobalt precursor. The study examines film growth, reaction mechanisms, chemical stability, and decomposition pathways of the resulting films through extensive characterization techniques and DFT calculations ...
Topias Jussila, Jorit Obenlüneschloß, Ji Liu, Olga Partanen, Sami Vasala, Detlef Rogalla, Pieter Glatzel, Michael Nolan, Anjana Devi, Maarit Karppinen   +9 more
wiley   +1 more source

Electron beam lithography assisted high-resolution pattern generation

, 2015
Anushka Gangnaik
openalex   +1 more source

Two‐Photon Polymerized Microvascular Environments for Multicellular Modeling of the Blood–Brain Tumor Barrier

Advanced Materials Technologies, EarlyView.
Modeling the blood–brain tumor barrier is challenging due to complex interactions between brain microvasculature and glioma cells. We present two‐photon polymerized 3D micro‐porous capillary‐like structures that support endothelial alignment, cytoskeletal organization, and pericyte‐endothelial‐glioma tri‐cultures.
Nastaran Barin, Sayba Z. Chowdhury, Maurice de Wit, Rania Head, Kiki Bals, Erwin Brosens, Marvin M. van Luijn, Hayri E. Balcioglu, Angelo Accardo, Pim J. French   +9 more
wiley   +1 more source

High‐Transmission Mid‐Infrared Bandpass Filters using Hybrid Metal‐Dielectric Metasurfaces for CO2 Sensing

Advanced Optical Materials, Volume 13, Issue 8, March 13, 2025.
This article presents a hybrid metal‐dielectric metasurface in transmission mode for mid‐infrared (MIR) spectroscopy. Composed of germanium on aluminium cylinders atop a calcium fluoride substrate, the metasurface achieves 80% transmission efficiency at λ = 2.6 µm with a narrow full‐width‐half‐maximum of 0.4 µm.
Amr Soliman, C Williams, Richard Hopper, Florin Udrea, Haider Butt, Timothy D. Wilkinson   +5 more
wiley   +1 more source