Results 11 to 20 of about 21,175 (304)

Gold Ion Beam Milled Gold Zero-Mode Waveguides

open access: yesNanomaterials, 2022
Zero-mode waveguides (ZMWs) are widely used in single molecule fluorescence microscopy for their enhancement of emitted light and the ability to study samples at physiological concentrations.
Troy C. Messina   +4 more
doaj   +1 more source

80 K cryogenic stage for ice lithography

open access: yesMicro and Nano Engineering, 2022
We present a cryogenic system design and development for ice lithography. The cryo-stage is designed with embedded channels to allow direct liquid nitrogen flow, enabling fast cryogenic cooling, and low sample temperature.
Rubaiyet I. Haque   +4 more
doaj   +1 more source

Nanoscale direct-write fabrication of superconducting devices for application in quantum technologies

open access: yesMaterials for Quantum Technology, 2023
In this Perspective article, we evaluate the current state of research on the use of focused electron and ion beams to directly fabricate nanoscale superconducting devices with application in quantum technologies.
José María De Teresa
doaj   +1 more source

In Situ Time-of-Flight Mass Spectrometry of Ionic Fragments Induced by Focused Electron Beam Irradiation: Investigation of Electron Driven Surface Chemistry inside an SEM under High Vacuum

open access: yesNanomaterials, 2022
Recent developments in nanoprinting using focused electron beams have created a need to develop analysis methods for the products of electron-induced fragmentation of different metalorganic compounds.
Jakub Jurczyk   +8 more
doaj   +1 more source

Substrate Effect in Electron Beam Lithography

open access: yesAdvances in Electrical and Electronic Engineering, 2018
Electron Beam Lithography (EBL) process strongly depends on the type of the applied lithographic system, composed of electron sensitive polymers and the substrate. Moreover, applied acceleration voltage changes the volume of Backscattered Electrons (BSE)
Kornelia Indykiewicz   +2 more
doaj   +1 more source

Tailoring electron beams with high-frequency self-assembled magnetic charged particle micro optics

open access: yesNature Communications, 2022
Electron beam manipulation is important for their application in microscopes, lithography instruments, and colliders. Here the authors report a wafer scale, self-assembled, microcoil electrically-driven magnetic charge particle optic device that can be ...
R. Huber   +13 more
doaj   +1 more source

Analysis of issues in gate recess etching in the InAlAs/InGaAs HEMT manufacturing process

open access: yesETRI Journal, 2023
We have developed an InAlAs/InGaAs metamorphic high electron mobility transistor device fabrication process where the gate length can be tuned within the range of 0.13 μm–0.16 μm to suit the intended application.
Byoung-Gue Min   +7 more
doaj   +1 more source

Evolution in Lithography Techniques: Microlithography to Nanolithography

open access: yesNanomaterials, 2022
In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily.
Ekta Sharma   +6 more
doaj   +1 more source

Electron caustic lithography

open access: yesAIP Advances, 2012
A maskless method of electron beam lithography is described which uses the reflection of an electron beam from an electrostatic mirror to produce caustics in the demagnified image projected onto a resist–coated wafer. By varying the electron optics, e.g.
S. M. Kennedy   +5 more
doaj   +1 more source

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