Results 191 to 200 of about 21,175 (304)
Inverse Lithography Technology (ILT) Under Chip Manufacture Context. [PDF]
Meng X, Chen C, Ni J.
europepmc +1 more source
A metal‐based thermal metasurface supporting bound states in the continuum is demonstrated and experimentally shown to achieve a record‐high quality factor of 202 and high emissivity of 0.82. The design offers thermally stable, narrowband mid‐infrared emission, making it ideal for high‐precision gas sensing applications.
Guodong Zhu +8 more
wiley +1 more source
Photonic Hybrid Integration: Strategies and Promises of Advanced Additive Manufacturing
Heterogeneous photonic integration combines wafer bonding, transfer printing, and advanced multi‐photon lithography to realize compact, adaptable photonic systems. This review highlights breakthroughs in hybrid materials, metrology, and 4D printing, revealing how the convergence of traditional and emerging fabrication unlocks scalable, high‐performance
Zhitian Shi +3 more
wiley +1 more source
A Single-Layer Full-Color Diffractive Waveguide by Lithography. [PDF]
Li Y +5 more
europepmc +1 more source
Responsive Visible‐Wavelength Metasurfaces from Porous Silicon Based on Fano Guided‐Mode Resonance
The article introduces mesoporous silicon metasurfaces (pSi‐MS) supporting Fano guided‐mode resonances in the visible regime. By combining top‐down lithographic patterning of 2D gratings with bottom‐up electrochemical porosification, the approach realizes a new class of responsive metasurfaces, enabling highly sensitive and portable platforms for small
Tomoshree Dash +4 more
wiley +1 more source
Low-loss silicon nitride Kerr-microresonators fabricated with metallic etch masks via metal lift-off. [PDF]
Colación GM, Rukh L, Buck FH, Drake TE.
europepmc +1 more source

