Results 211 to 220 of about 21,175 (304)

Quasi‐Bound States in the Continuum on the Bloch‐Surface‐Wave Platform for Sensing With Simultaneous High Q‐Factor and High Sensitivity

Advanced Optical Materials, EarlyView.
Quasi‐bound states in the continuum on the Bloch surface wave platform are demonstrated, exhibiting high Q‐factors due to strongly suppressed radiative losses and high sensitivity arising from the large evanescent field inherent to the surface wave. The resonance shows clear shifts after each surface molecular functionalization step, highlighting its ...
Bo‐Wei Lin, Mu‐Hsin Chen, Yang‐Chun Lee, Tang Dang, Di Xing, Hiroaki Matsui, Jean‐Jacques Delaunay   +6 more
wiley   +1 more source

High-efficiency broadband active metasurfaces via reversible metal electrodeposition. [PDF]

Light Sci Appl
Li Q, Kulkarni SP, Sui C, Chen TH, Yan G, Wu R, Chen W, Hung PJ, Wu X, Emersic T, Aydin K, Hsu PC.   +11 more
europepmc   +1 more source

Progress Report III: Fabrication of Nanopores in Silicon Nitride Membranes using Electron-beam Lithography

, 2020
Mingxuan Ma, Hiromichi Yamamoto
openalex   +1 more source

Polarization‐Sensitive Au‐TiO2 Nanopillars for Tailored Plasmonic Enhanced Light‐Driven Reaction Activity

Advanced Optical Materials, EarlyView.
Manipulating the product generation yield is achieved on a model plasmonic resonance‐driven reaction by tuning the nonthermal effects of localized surface plasmonic resonance on an elliptical Au‐TiO2 nanopillar metasurface. Asymmetric configuration of the elliptical nanopillar array governs the polarization‐dependent optical properties redshifting the ...
Ning Lyu, Anjalie Edirisooriya, Zelio Fusco, Dawei Liu, Lan Fu, Fiona J. Beck, Christin David   +6 more
wiley   +1 more source

Experimental demonstration of spatiotemporal analog computation in ultrafast optics. [PDF]

Light Sci Appl
Huang J, Zhao D, Shi J, Zhang H, Wang H, Sun FW, Zhan Q, Zhu S, Huang K, Ruan Z.   +9 more
europepmc   +1 more source

Process modeling for proximity effect correction in electron beam lithography

, 2015
Thiago Figueiro
openalex   +1 more source

In Situ Electron-Beam Lithography of GaAs Using UHV Multichamber System.

, 1992
Yoshimasa Sugimoto, Hidenori Kawanishi, Tomonori Ishikawa   +2 more
openalex   +2 more sources

Harnessing Ultrafast Optical Pulses for 3D Microfabrication by Selective Tweezing and Immobilization of Colloidal Particles in an Integrated System

Advanced Photonics Research, Volume 6, Issue 5, May 2025.
Microfabrication using nano‐ to micron‐sized blocks has transformative potential for next‐gen electronics, optoelectronics, and materials. Traditional methods are limited by scalability and precision. STIC, a single‐laser system for precise colloid manipulation and immobilization using femtosecond lasers, is introduced that enables efficient 3D ...
Krishangi Krishna, Jieliyue Sun, Wenyu Liu, Robert H. Hurt, Kimani C. Toussaint Jr.   +4 more
wiley   +1 more source

Tuning Surface-Enhanced Raman Scattering (SERS) via Filling Fraction and Period in Gold-Coated Bullseye Gratings. [PDF]

Nanomaterials (Basel)
Li Z, Cheng Y, Fernandes C, Wang X, Ruda HE.   +4 more
europepmc   +1 more source

An Ultra‐Wideband Metasurface Perfect Absorber Based on Hybrid Absorption Modes

Advanced Photonics Research, EarlyView.
A Ge2Sb2Te5 metasurface absorber enables polarization‐independent, ultrabroadband (UV–NIR) light absorption with high angular tolerance. Its performance stems from overlapping electric and magnetic dipole resonances in a symmetric structure, achieving 94% average absorption and maintaining 83% even at 70° incidence, promising for integrated ...
Dingbang Liu, Yusa Chen, Yunhao Cao, Lijun Ma, Shuai Wang, HongShun Sun, Mingyao Gao, Dingyi Yang, Wengang Wu   +8 more
wiley   +1 more source