Results 241 to 250 of about 21,175 (304)
Large-Area Nanostructure Fabrication with a 75 nm Half-Pitch Using Deep-UV Flat-Top Laser Interference Lithography. [PDF]
Sensors (Basel)Jiang K, Xie M, Tang Z, Zhang X, Yang D.
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Low-voltage spatial-phase-locked scanning-electron-beam lithography
, 2010 Lin Lee Cheong
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Stress-Induced Directed Self-Assembly of Perpendicularly Oriented Block Copolymer Lamellae for Lithographic Density Multiplication. [PDF]
ACS Appl Mater InterfacesPanda AS +10 more
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Cryo-electron tomography reconstructs polymer in liquid film for fab-compatible lithography. [PDF]
Nat CommunZheng L +15 more
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Physics World, 1997
Lithography – literally "stone writing" – is a process that is fundamental to the manufacture of integrated circuits. It is improvements in this process that have largely enabled the spectacular advances that have been made in the field of microelectronics over the last three decades.
Lloyd Harrlott, Alexander Liddle
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Lithography – literally "stone writing" – is a process that is fundamental to the manufacture of integrated circuits. It is improvements in this process that have largely enabled the spectacular advances that have been made in the field of microelectronics over the last three decades.
Lloyd Harrlott, Alexander Liddle
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Low Voltage Electron Beam Lithography
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1992Abstract : In order to measure the energy spread of electrons emitted from various negative electron affinity cathode structures, a simple apparatus using a uniform retarding field inside night vision tubes and customized tubes (all made by Intevac) was constructed and initial measurements performed.
R. F. Pease, R. Browning
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Contemporary Physics, 1981
Abstract Electron beam lithography means writing patterns in thin films of electron sensitive material using a finely focused (sub-micrometre diameter) electron beam. By combining electrical scanning with interferometrically monitored mechanical motion, very complex patterns can be generated with great accuracy; for example, a pattern containing one ...
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Abstract Electron beam lithography means writing patterns in thin films of electron sensitive material using a finely focused (sub-micrometre diameter) electron beam. By combining electrical scanning with interferometrically monitored mechanical motion, very complex patterns can be generated with great accuracy; for example, a pattern containing one ...
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Electron beam array lithography
Journal of Vacuum Science and Technology, 1981Electron-beam array lithography (EBAL) uses array optics to expose 108 to 1010 resolution elements without mechanical motion. The array optics are based on the use of a first stage of deflection (coarse deflection) which selects one of an array of lenslets.
D. O. Smith, K. J. Harte
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