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Multiple scattered electron-beam effect in electron-beam lithography
SPIE Proceedings, 1991The multiple electron beam scattering effect is studied experimentally in an electron optical column. This effect causes a serious problem on the critical dimension of LSI pattern when the whole area of a wafer is exposed to an electron beam. This paper discusses the quantitative analysis and a method of reducing this effect.
Norio Saitou, Teruo Iwasaki, Fumio Murai
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Cell projection electron-beam lithography
SPIE Proceedings, 1994The HL-800D cell-projection e-beam lithography system was developed to meet the need for quarter-micron direct writing. It is the first commercially available cell projection system. Using the original HL-700 series concepts and Hitachi's more than 20 years of experience with HL-series manufacturing, most of the subsystems were redesigned.
Norio Saitou, Yoshio Sakitani
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Nanometric-Scale Electron Beam Lithography
1992Publisher Summary This chapter focuses on electronbeam microlithography. Emphasis is on system design and the various ways of exploiting the interaction between focusing and deflecting fields. A comprehensive comparison of the various approaches is given, as well as a detailed study of the author's own contribution to the field, namely, the swinging ...
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Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks
Nature Materials, 2020Min Tu +2 more
exaly
Soft lithography for micro- and nanoscale patterning
Nature Protocols, 2010Dong Qin, Younan Xia
exaly