Results 271 to 280 of about 81,341 (318)

A Correlative Study of Plasmonic Metasurfaces by Electron Energy-Loss Spectroscopy and Optical Spectroscopy: From Nanoscale Hotspots to Macroscale Optical Response. [PDF]

Nano Lett
Serra Gonzalez M, Kavkani PH, Deshpande RA, Kadkhodazadeh S, Taboryski R.   +4 more
europepmc   +1 more source

Nonlinear Optical Microscopy of Semiconductor–Metal Nanocavities

Advanced Photonics Research, EarlyView.
Three‐dimensional nonlinear optical microscopy is used to visualize GaAs–gold hybrid nanocavities. By carefully selecting the pump wavelength to position the harmonic generation at the nanopillar resonance, an enhanced contrast is observed in the nonlinear imaging.
Riya Varghese, Shambhavee Annurakshita, Yaraslau Tamashevich, Abhiroop Chellu, Subhajit Bej, Heikki Rekola, Jari Lyytikäinen, Hanna Wahl, Matias Schildt, Ali Panahpour, Tapio Niemi, Marco Ornigotti, Petri Karvinen, Mircea Guina, Teemu Hakkarainen, Mikko J. Huttunen   +15 more
wiley   +1 more source

In Situ Growth, Etching, and Charging of Nanoscale Water Ice Under Fast Electron Irradiation in Environmental TEM. [PDF]

Nanomaterials (Basel)
Chu H, An Q, Ye X, Wu D, Liang B, Su J, Li Z.   +6 more
europepmc   +1 more source

Deterministic Fabrication of Fluorescent Nanostructures Featuring Distinct Optical Transitions. [PDF]

Nanomaterials (Basel)
Rikers M, Bashiri A, Barreda Á, Steinert M, Choi DY, Choi DY, Pertsch T, Staude I.   +7 more
europepmc   +1 more source

Polytelluoxane as the ideal formulation for EUV photoresist. [PDF]

Sci Adv
Zhou R, Cao M, Tan Y, Neisser M, Xu H.
europepmc   +1 more source

Spectroscopic Ellipsometry of Plasmonic Gratings-Ideal Parameters for Sensing and Subpicometer Measurement Uncertainty. [PDF]

ACS Omega
Mukherjee D, Burger S, Siefke T, Gour J, Bodermann B, Petrik P.   +5 more
europepmc   +1 more source

Innovative Micro- and Nano-Architectures in Biomedical Engineering for Therapeutic and Diagnostic Applications. [PDF]

Micromachines (Basel)
Parvin N, Joo SW, Jung JH, Mandal TK.
europepmc   +1 more source

Electron-beam lithography for small MOSFET's [PDF]

IEEE Transactions on Electron Devices, 1980
Electron-beam lithography with a novel multilevel resist structure together with two-dimensional process and device modeling and dry processing with reactive sputter etching have been employed to produce silicon-gate NMOS devices with micrometer and submicrometer channel lengths. Results for transistors and ring oscillators are reported.
Wolfgang Fichtner, R.L. Johnston, E.N. Fuls, R.K. Watts, L.R. Thibault   +4 more
openaire   +2 more sources

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Electron-beam lithography

Physics World, 1997
Lithography – literally "stone writing" – is a process that is fundamental to the manufacture of integrated circuits. It is improvements in this process that have largely enabled the spectacular advances that have been made in the field of microelectronics over the last three decades.
Alexander Liddle, Lloyd Harrlott
openaire   +2 more sources