Results 21 to 30 of about 21,175 (304)

Inverse design of high-NA metalens for maskless lithography

Nanophotonics, 2023
We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry.
Chung Haejun, Zhang Feng, Li Hao, Miller Owen D., Smith Henry I.   +4 more
doaj   +1 more source

The Validation of Various Technological Factors Impact on the Electron Beam Lithography Process

Advances in Electrical and Electronic Engineering, 2021
One of the most significant processes in micro- and nanoelectronics technology is Electron Beam Lithography (EBL). This technique maintains a leading role in extremely high-resolution structures fabrication process with micro- and nanometer dimensions ...
Agnieszka Zawadzka, Kornelia Indykiewicz, Regina Paszkiewicz   +2 more
doaj   +1 more source

Charged particle single nanometre manufacturing

Beilstein Journal of Nanotechnology, 2018
Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject
Philip D. Prewett, Cornelis W. Hagen, Claudia Lenk, Steve Lenk, Marcus Kaestner, Tzvetan Ivanov, Ahmad Ahmad, Ivo W. Rangelow, Xiaoqing Shi, Stuart A. Boden, Alex P. G. Robinson, Dongxu Yang, Sangeetha Hari, Marijke Scotuzzi, Ejaz Huq   +14 more
doaj   +1 more source

Fabrication characteristics of a line-and-space pattern and a dot pattern on a roll mold by using electron-beam lithography

Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2016
Roll-to-roll nanoimprint lithography (RTR-NIL) has received considerable attention because it permits large-area nanopatterning with both high resolution and high throughput.
Kai OJIMA, Masashi SAITO, Noriyuki UNNO, Jun TANIGUCHI   +3 more
doaj   +1 more source

Process study and the lithographic performance of commercially available silsesquioxane based electron sensitive resist Medusa 82

Micro and Nano Engineering, 2020
In the past 2 decades silsesquioxane has gained attention in the Electron Beam Lithography community as a negative tone electron-sensitive resist (HSQ) whose advantages (sub-20 nm resolution, high contrast, low Line Edge Roughness, good shape fidelity ...
Th. Mpatzaka, G. Zisis, I. Raptis, V. Vamvakas, C. Kaiser, T. Mai, M. Schirmer, M. Gerngroß, G. Papageorgiou   +8 more
doaj   +1 more source

Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

Nanomaterials, 2023
Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes.
Taewoo Ko, Samir Kumar, Sanghoon Shin, Dongmin Seo, Sungkyu Seo   +4 more
doaj   +1 more source

Synchrotron Radiation for Quantum Technology

Advanced Functional Materials, EarlyView.
Materials and interfaces underpin quantum technologies, with synchrotron and FEL methods key to understanding and optimizing them. Advances span superconducting and semiconducting qubits, 2D materials, and topological systems, where strain, defects, and interfaces govern performance.
Oliver Rader, Sakura Pascarelli, Klaus Attenkofer, Anna A. Makarova, Karsten Holldack, Kai Rossnagel, Kristiaan Temst, George Kourousias, Stefano Carretta, Caterina Biscari, Helmut Dosch   +10 more
wiley   +1 more source

Positive‐Tone Nanolithography of Antimony Trisulfide with Femtosecond Laser Wet‐Etching

Advanced Functional Materials, EarlyView.
A butyldithiocarbamic acid (BDCA) etchant is used to fabricate various micro‐ and nanoscale structures on amorphous antimony trisulfide (a‐Sb2S3) thin film via femtosecond laser etching. Numerical analysis and experimental results elucidate the patterning mechanism on gold (reflective) and quartz (transmissive) substrates.
Abhrodeep Dey, Uwe Hübner, Albane Benardais, Xiaofei Wu, Andrea Dellith, Jan Dellith, Torsten Wieduwilt, Henrik Schneidewind, Markus A Schmidt, Virginie Nazabal, Volker Deckert, Jer‐Shing Huang, Wei Wang   +12 more
wiley   +1 more source

Residue-free fabrication of high-performance graphene devices by patterned PMMA stencil mask

AIP Advances, 2014
Two-dimensional (2D) atomic crystals and their hybrid structures have recently attracted much attention due to their potential applications. The fabrication of metallic contacts or nanostructures on 2D materials is very common and generally achieved by ...
Fu-Yu Shih, Shao-Yu Chen, Cheng-Hua Liu, Po-Hsun Ho, Tsuei-Shin Wu, Chun-Wei Chen, Yang-Fang Chen, Wei-Hua Wang   +7 more
doaj   +1 more source

Clean‐Limit 2D Superconductivity in a Thick Exfoliated Kagome Film

Advanced Functional Materials, EarlyView.
This study reports clean‐limit 2D superconductivity in a thick kagome system, analogous to the 3D case. It observes a drop in superfluid stiffness near the superconducting transition and a cusp‐like feature in the angular dependence of the upper critical field.
Fei Sun, Andrea Capa Salinas, Stephen D. Wilson, Haijing Zhang   +3 more
wiley   +1 more source