Tailoring electron beams with high-frequency self-assembled magnetic charged particle micro optics
Nature Communications, 2022 Electron beam manipulation is important for their application in microscopes, lithography instruments, and colliders. Here the authors report a wafer scale, self-assembled, microcoil electrically-driven magnetic charge particle optic device that can be ...
R. Huber +13 more
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Analysis of issues in gate recess etching in the InAlAs/InGaAs HEMT manufacturing process
ETRI Journal, 2023 We have developed an InAlAs/InGaAs metamorphic high electron mobility transistor device fabrication process where the gate length can be tuned within the range of 0.13 μm–0.16 μm to suit the intended application.
Byoung-Gue Min +7 more
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Evolution in Lithography Techniques: Microlithography to Nanolithography
Nanomaterials, 2022 In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily.
Ekta Sharma +6 more
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Fabrication of Nano-Gapped Single-Electron Transistors for Transport Studies of Individual Single-Molecule Magnets [PDF]
, 2007 Three terminal single-electron transistor devices utilizing Al/Al2O3 gate electrodes were developed for the study of electron transport through individual single-molecule magnets.
Christou, G. +4 more
core +3 more sources
AIP Advances, 2012 A maskless method of electron beam lithography is described which uses the reflection of an electron beam from an electrostatic mirror to produce caustics in the demagnified image projected onto a resist–coated wafer. By varying the electron optics, e.g.
S. M. Kennedy +5 more
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Surface micromachined membranes for tunnel transducers [PDF]
, 1997 We have developed low-temperature surface micromachining procedures for the fabrication of suspended SiO2/Si3N4 membranes. This fabrication method was integrated with electron beam lithography, anisotropic ion etching, and electroplating to construct ...
George, Thomas +2 more
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Dose influence on the PMMA e-resist for the development of high-aspect ratio and reproducible sub-micrometric structures by electron beam lithography [PDF]
, 2016 In this work, a statistical process control method is presented showing the accuracy and the reliability obtained with of PMMA E-resist AR-P 672, using an Elphy Quantum Electron Beam Lithography module integrated on a FE-SEM Zeiss Auriga instrument ...
Balucani, Marco +3 more
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Increasing optical metamaterials functionality [PDF]
, 2005 Gold Split Ring Resonators (SRRs) were fabricated on silicon substrates by electron beam lithography and lift-off, with overall dimensions of approximately 200 nm. Reflectance spectra from the SRRs are similar to those published elsewhere.
Chong, H.M. +6 more
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Design and fabrication of blazed gratings for a waveguide-type head mounted display [PDF]
, 2020 In a waveguide-type display for augmented reality, the image is injected in the waveguide and extracted in front of the eye appearing superimposed on the real-world scene.
Cuypers, Dieter +4 more
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Diffractive lens fabrication by replica molding [PDF]
, 2001 Diffractive lenses and 2-D gratings were fabricated using electron-beam lithography and replica molding. With electron-beam lithography, feature sizes smaller than 60 nm can be achieved.
Lee, Benjamin G., Scherer, Axel
core +1 more source