Results 51 to 60 of about 81,341 (318)
Symmetry‐broken plasmonic nanoantenna arrays achieve broadband multiresonant enhancement of second harmonic generation (SHG), third harmonic generation (THG), and upconversion photoluminescence (UCPL), under femtosecond laser excitation across the near‐infrared range (1000–1600 nm).
Elieser Mejia+9 more
wiley +1 more source
Spin‐Selective Anisotropic Magnetoresistance Driven by Chirality in DNA
It is shown that magnetoresistance (MR) measurements carried out as a function of angular dependence between the magnetic field and a chiral (DNA) interface provide a valuable new insight into the charge transport mechanism associated with the chiral‐induced spin selectivity (CISS) effect.
Tapan Kumar Das+4 more
wiley +1 more source
Two-speed deflection system for electron micropattern generator [PDF]
Development of dual speed deflection system for electron beam micropattern generator system is discussed. Factors affecting application of electron beam lithography are analyzed.
Malmberg, P. R.
core +1 more source
Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist [PDF]
A scanning-helium-ion-beam microscope is now commercially available. This microscope can be used to perform lithography similar to, but of potentially higher resolution than, scanning electron-beam lithography.
A. E. Vladar+13 more
core +1 more source
The fabrication of patterned transition metal dichalcogenide (TMD)/graphene heterostructures via direct laser writing reveals new interface chemistry and enables efficient, customizable assembly. Selective laser irradiation of functionalized TMD/graphene triggers localized reactions, forming chemically modified interfaces.
Xin Chen+12 more
wiley +1 more source
LITHOGRAPHIC TECHNOLOGIES FOR SUBMICRONIC PATTERNS DESIGN APPLIED IN MICROSENSORS DOMAIN
The present article is based on the results of a project that had as main objective to achieve submicronic patterns using different lithography techniques - electron beam lithography and atomic force microscopy lithography. Ways to obtain these patterns
Liliana Laura Badita+3 more
doaj
Herein, an Intra-level Mix & Match approach (ILM&M) was investigated to combine electron beam lithography (EBL) and i-line stepper lithography on the same resist layer.
C. Helke+6 more
doaj +1 more source
We performed comparative experimental investigation of superconducting NbN nanowires which were prepared by means of positive-and negative electron-beam lithography with the same positive tone Poly-methyl-methacrylate (PMMA) resist.
A. Kuzmin+11 more
core +2 more sources
Quantum Emitters in Hexagonal Boron Nitride: Principles, Engineering and Applications
Quantum emitters in hexagonal boron nitride have emerged as a promising candidate for quantum information science. This review examines the fundamentals of these quantum emitters, including their level structures, defect engineering, and their possible chemical structures.
Thi Ngoc Anh Mai+8 more
wiley +1 more source
The incorporation of interface passivation structures in ultrathin Cu(In,Ga)Se2 based solar cells is shown. The fabrication used an industry scalable lithography technique—nanoimprint lithography (NIL)—for a 15 × 15 cm2 dielectric layer patterning ...
T. S. Lopes+23 more
doaj +1 more source