Results 51 to 60 of about 81,341 (318)

Multi‐Pathway Upconversion Emission in Symmetry‐Broken Nanocavities: Broadband Multiresonant Enhancement and Anti‐Correlated Interfacial Sensitivity

open access: yesAdvanced Functional Materials, EarlyView.
Symmetry‐broken plasmonic nanoantenna arrays achieve broadband multiresonant enhancement of second harmonic generation (SHG), third harmonic generation (THG), and upconversion photoluminescence (UCPL), under femtosecond laser excitation across the near‐infrared range (1000–1600 nm).
Elieser Mejia   +9 more
wiley   +1 more source

Spin‐Selective Anisotropic Magnetoresistance Driven by Chirality in DNA

open access: yesAdvanced Functional Materials, EarlyView.
It is shown that magnetoresistance (MR) measurements carried out as a function of angular dependence between the magnetic field and a chiral (DNA) interface provide a valuable new insight into the charge transport mechanism associated with the chiral‐induced spin selectivity (CISS) effect.
Tapan Kumar Das   +4 more
wiley   +1 more source

Two-speed deflection system for electron micropattern generator [PDF]

open access: yes, 1972
Development of dual speed deflection system for electron beam micropattern generator system is discussed. Factors affecting application of electron beam lithography are analyzed.
Malmberg, P. R.
core   +1 more source

Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist [PDF]

open access: yes, 2009
A scanning-helium-ion-beam microscope is now commercially available. This microscope can be used to perform lithography similar to, but of potentially higher resolution than, scanning electron-beam lithography.
A. E. Vladar   +13 more
core   +1 more source

Patterned Assembly of Transition Metal Dichalcogenide/Graphene Heterostructures via Direct Laser Writing

open access: yesAdvanced Functional Materials, EarlyView.
The fabrication of patterned transition metal dichalcogenide (TMD)/graphene heterostructures via direct laser writing reveals new interface chemistry and enables efficient, customizable assembly. Selective laser irradiation of functionalized TMD/graphene triggers localized reactions, forming chemically modified interfaces.
Xin Chen   +12 more
wiley   +1 more source

LITHOGRAPHIC TECHNOLOGIES FOR SUBMICRONIC PATTERNS DESIGN APPLIED IN MICROSENSORS DOMAIN

open access: yesNonconventional Technologies Review, 2019
The present article is based on the results of a project that had as main objective to achieve submicronic patterns using different lithography techniques - electron beam lithography and atomic force microscopy lithography. Ways to obtain these patterns
Liliana Laura Badita   +3 more
doaj  

Intra-level mix and match lithography with electron beam lithography and i-line stepper combined with resolution enhancement for structures below the CD-limit

open access: yesMicro and Nano Engineering, 2023
Herein, an Intra-level Mix & Match approach (ILM&M) was investigated to combine electron beam lithography (EBL) and i-line stepper lithography on the same resist layer.
C. Helke   +6 more
doaj   +1 more source

Enhancement of superconductivity in NbN nanowires by negative electron-beam lithography with positive resist

open access: yes, 2017
We performed comparative experimental investigation of superconducting NbN nanowires which were prepared by means of positive-and negative electron-beam lithography with the same positive tone Poly-methyl-methacrylate (PMMA) resist.
A. Kuzmin   +11 more
core   +2 more sources

Quantum Emitters in Hexagonal Boron Nitride: Principles, Engineering and Applications

open access: yesAdvanced Functional Materials, EarlyView.
Quantum emitters in hexagonal boron nitride have emerged as a promising candidate for quantum information science. This review examines the fundamentals of these quantum emitters, including their level structures, defect engineering, and their possible chemical structures.
Thi Ngoc Anh Mai   +8 more
wiley   +1 more source

Cu(In,Ga)Se2 based ultrathin solar cells the pathway from lab rigid to large scale flexible technology

open access: yesnpj Flexible Electronics, 2023
The incorporation of interface passivation structures in ultrathin Cu(In,Ga)Se2 based solar cells is shown. The fabrication used an industry scalable lithography technique—nanoimprint lithography (NIL)—for a 15 × 15 cm2 dielectric layer patterning ...
T. S. Lopes   +23 more
doaj   +1 more source

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