Results 141 to 150 of about 330,347 (201)

The electron-beam FGT process

International Journal of Radiation Applications and Instrumentation. Part C. Radiation Physics and Chemistry, 1990
Abstract The electron-beam process is one of the most effective methods of removing SO 2 and NO x from industrial flue gases. This flue gas treatment consists of adding a small amount of ammonia to the flue gas and irradiating the gas by means of an electron beam, thereby causing reactions which convert the SO 2 and NO x to ammonium sulfate and ...
Norman W. Frank, Shinichi Hirano
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Economics of the Electron Beam Process

Radiation Physics and Chemistry, 1993
In the past many cost analyses of the electron beam process have been made by various consultants, contractors and companies. It is extremely difficult to make comparisons of the various estimates because many different assumptions are made by the different people doing the estimates. One of the assumptions is always the cost of the accelerators.
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Electron Beam Processing of Foods

2019
Electron beam (eBeam) irradiation is one of the main three principal ionizing radiation techniques that are available to myriads of different industries including the food industry. A magnet focuses the generated beam of electrons in order to control the pattern in which the beam leaves the gun. Considering the source of energy, speed, cost, and safety,
Shima Shayanfar, Suresh D. Pillai
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Micro processing by intense fast electron beams

IEEE Conference Record - Abstracts. PPPS-2001 Pulsed Power Plasma Science 2001. 28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference (Cat. No.01CH37255), 2002
Summary form only given, as follows. The generation of intense electron beams by superposing two discharges namely low pressure DC glow discharge and a high current pulsed discharge (at gas pressures and voltages very similar to the pseudospark gap devices) has been reported.
Goktas, HİLAL, UDREA, M, OKE, G, KIRKICI, H   +3 more
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Electron Beam Processing

1989
Publisher Summary This chapter provides an overview of electron beam processing. Particle beams, such as photon, electron, and ion beams, are frequently used in microfabrication for the production of integrated circuits (ICs) and for testing. Electron beams play an important role in submicrometer lithography, electron beam-assisted processes, such as
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Statistical process control for electron beam monitoring

Physica Medica, 2015
To assess the electron beam monitoring statistical process control (SPC) in linear accelerator (linac) daily quality control. We present a long-term record of our measurements and evaluate which SPC-led conditions are feasible for maintaining control.We retrieved our linac beam calibration, symmetry, and flatness daily records for all electron beam ...
Juan, López-Tarjuelo, Naika, Luquero-Llopis, Rafael, García-Mollá, Juan David, Quirós-Higueras, Ana, Bouché-Babiloni, Xavier Jordi, Juan-Senabre, Noelia, de Marco-Blancas, Carlos, Ferrer-Albiach, Agustín, Santos-Serra   +8 more
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Thin film processing with pulsed electron beams

Thin Solid Films, 1989
Abstract Pulsed electron beam applications for thin film processing are described. In particular, we review and discuss the relevant results obtained in our laboratories in the fields of the synthesis of metal silicides, of silicon carbide and of the alloying of immiscible metals.
D'ANNA E, LEGGIERI, Gilberto, LUCHES A.
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Accelerator requirements for electron beam processing

Radiation Physics and Chemistry (1977), 1979
Abstract This paper discusses the physical aspects of electron beam processing and presents practical methods for estimating the required specifications of the electron accelerator. The accelerator voltage (electron energy) is determined by the thickness and density of the irradiated material.
R.C. Becker, J.H. Bly, M.R. Cleland, J.P. Farrell   +3 more
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Focused Electron Beam–Induced Processing

2019
This chapter explores the electron-induced chemistry underlying focused electron beam–induced deposition (FEBID) processes and the approaches of state-of-theart work in this area. It proposes a basic knowledge of the technique itself, the physics behind the production of low-energy secondary electrons (SE) under the focused high-energy electron beam ...
D. Howard Fairbrother, Samantha G. Rosenberg, Cornelis W. Hagen, I. Utke, Swiderek Petra   +4 more
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Electron-Beam Plasma-Doping Process

Journal of Applied Physics, 1971
A novel localized doping process using an electron beam as an energy source and a dopant foil as a dopant source is described. Rectifying silicon p-on-n and n-on-p junctions were made. The process presents several attractive features.
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