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One‐Step Radical‐Intensified Selective Etching (RISE) Strategy for High‐Yield Synthesis of Monolayer MXene with Tailored Nanoholes

open access: yesAngewandte Chemie, EarlyView.
Radical‐intensified selective etching (RISE) delivers monolayer MXenes with >80% yield in just 3 h etching process. Controlled ·OH dosage enables one‐step access to holey MXenes with abundant nanopores or defect‐lean flakes. This mild, safe strategy couple ultrafast kinetics with structural tunability, advancing precision design of MXene architectures.
Chenxu Liu   +8 more
wiley   +1 more source

The electronic Payment Systems Observatory - ePSO

open access: yesTATuP - Zeitschrift für Technikfolgenabschätzung in Theorie und Praxis, 2002
openaire   +4 more sources

Cost Avoidance Associated with Aspirin De-Prescribing Among Patients Receiving Warfarin. [PDF]

open access: yesTH Open
Falvello V   +12 more
europepmc   +1 more source

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