Results 331 to 340 of about 536,254 (376)
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The Behaviour of the Etching Rate in a Model of Plasma Etching
ZAMM - Journal of Applied Mathematics and Mechanics / Zeitschrift für Angewandte Mathematik und Mechanik, 1994AbstractDiese Arbeit ist sowohl der Modellierung einiger Oberflächen‐ und Volumenprozesse beim Plasmaätzen durch gewöhnliche Differentialgleichungen als auch der qualitativen Untersuchung des resultierenden Systems gewidmet. Die explizite Konstruktion von Attraktoreinhüllenden erlaubt, die Ätzrate des Prozesses durch eine Folge von Schranken ...
Kern, Marietta, Koksch, Norbert
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Preferential Etching and Etched Profile of GaAs
Journal of The Electrochemical Society, 1971The system has been found to give good results for preferential etching of . The etch rates for the low‐index planes of in this system have been investigated as a function of Br2 concentrations in .The order of the etch rate at 1% Br2 by weight has been found to be planes have been only slightl yetched.
Yasuo Tarui, Yoshio Komiya, Yasoo Harada
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Journal of Vacuum Science and Technology, 2019
Plasma etching of high aspect ratio (HAR) features, typically vias, is a critical step in the fabrication of high capacity memory. With aspect ratios (ARs) exceeding 50 (and approaching 100), maintaining critical dimensions (CDs) while eliminating or ...
Shuo Huang +6 more
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Plasma etching of high aspect ratio (HAR) features, typically vias, is a critical step in the fabrication of high capacity memory. With aspect ratios (ARs) exceeding 50 (and approaching 100), maintaining critical dimensions (CDs) while eliminating or ...
Shuo Huang +6 more
semanticscholar +1 more source
Etching Techniques in 2D Materials
Advanced Materials & Technologies, 20192D materials including graphene, transition metal dichalcogenides, and phosphorene have been widely researched for electronic and optoelectronic applications in recent years.
T. He +5 more
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Selective Etching of Silicon from Ti3 SiC2 (MAX) To Obtain 2D Titanium Carbide (MXene).
Angewandte Chemie, 2018Mohamed Alhabeb +7 more
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Scientific American
The article examines etching as a unique technique of graphic art, its historical development, technical features and place in the context of world artistic culture. The influence of technological changes on the evolution of etching and its application in various historical eras is analyzed.
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The article examines etching as a unique technique of graphic art, its historical development, technical features and place in the context of world artistic culture. The influence of technological changes on the evolution of etching and its application in various historical eras is analyzed.
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Metal‐Assisted Chemical Etching of Silicon: A Review
Advances in Materials, 2011Zhipeng Huang +4 more
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Preparation of Ti3C2 and Ti2C MXenes by fluoride salts etching and methane adsorptive properties
, 2017Fanfan Liu +6 more
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