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The Behaviour of the Etching Rate in a Model of Plasma Etching

ZAMM - Journal of Applied Mathematics and Mechanics / Zeitschrift für Angewandte Mathematik und Mechanik, 1994
AbstractDiese Arbeit ist sowohl der Modellierung einiger Oberflächen‐ und Volumenprozesse beim Plasmaätzen durch gewöhnliche Differentialgleichungen als auch der qualitativen Untersuchung des resultierenden Systems gewidmet. Die explizite Konstruktion von Attraktoreinhüllenden erlaubt, die Ätzrate des Prozesses durch eine Folge von Schranken ...
Kern, Marietta, Koksch, Norbert
openaire   +1 more source

Preferential Etching and Etched Profile of GaAs

Journal of The Electrochemical Society, 1971
The system has been found to give good results for preferential etching of . The etch rates for the low‐index planes of in this system have been investigated as a function of Br2 concentrations in .The order of the etch rate at 1% Br2 by weight has been found to be planes have been only slightl yetched.
Yasuo Tarui, Yoshio Komiya, Yasoo Harada
openaire   +1 more source

Plasma etching of high aspect ratio features in SiO2 using Ar/C4F8/O2 mixtures: A computational investigation

Journal of Vacuum Science and Technology, 2019
Plasma etching of high aspect ratio (HAR) features, typically vias, is a critical step in the fabrication of high capacity memory. With aspect ratios (ARs) exceeding 50 (and approaching 100), maintaining critical dimensions (CDs) while eliminating or ...
Shuo Huang   +6 more
semanticscholar   +1 more source

Etching Techniques in 2D Materials

Advanced Materials & Technologies, 2019
2D materials including graphene, transition metal dichalcogenides, and phosphorene have been widely researched for electronic and optoelectronic applications in recent years.
T. He   +5 more
semanticscholar   +1 more source

Selective Etching of Silicon from Ti3 SiC2 (MAX) To Obtain 2D Titanium Carbide (MXene).

Angewandte Chemie, 2018
Mohamed Alhabeb   +7 more
semanticscholar   +1 more source

ETCHINGS

Activities, Adaptation & Aging, 1982
Marian Smith   +1 more
openaire   +2 more sources

ETCHING

Scientific American
The article examines etching as a unique technique of graphic art, its historical development, technical features and place in the context of world artistic culture. The influence of technological changes on the evolution of etching and its application in various historical eras is analyzed.
openaire   +2 more sources

Metal‐Assisted Chemical Etching of Silicon: A Review

Advances in Materials, 2011
Zhipeng Huang   +4 more
semanticscholar   +1 more source

Preparation of Ti3C2 and Ti2C MXenes by fluoride salts etching and methane adsorptive properties

, 2017
Fanfan Liu   +6 more
semanticscholar   +1 more source

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