Results 251 to 260 of about 18,009 (279)
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The pickup of ion beam etching depth information during microfabrication
SPIE Proceedings, 2003Based on scalar quantity diffraction theory, the phase grating of micro-optics structure is studied. The light intensity distribution of diffraction fields is obtained. Results show that the peak position of light intensity moved with the variation of ion beam etching depth.
Guangxing Zhao, Yan Wang
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Microfabricated Deep-Etched Structures for ICF and Equation-of-State Targets
Fusion Science and Technology, 2009Microfabrication techniques, derived from the semiconductor industry, can be used to make a variety of useful mechanical components for targets.
Robin Miles +7 more
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Direct writing for three-dimensional microfabrication using synchrotron radiation etching
Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308), 2001 This paper presents rapid three-dimensional microfabrication technologies for PTFE by direct writing with the TIEGA process, a LIGA-like process which replaces hard X-ray lithography with synchrotron radiation (SR) direct photo-etching. The etching rates of this process are of the order of 6-100 /spl mu/m/min, depending on the photon flux of the SR ...
Takanori Katoh +4 more
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Japanese Journal of Applied Physics, 2012
We demonstrated that bacterial cells can be used as a mask material for microfabrication of GaAs and Si by a Cl2 inductively coupled plasma (ICP) etching process. The etching rate of Escherichia coli cells was similar to that of electron beam resist or nanoimprint resist. We also demonstrated the degradation of bacterial cells by low-pressure plasma
Akihiro Matsutani, Ayako Takada
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We demonstrated that bacterial cells can be used as a mask material for microfabrication of GaAs and Si by a Cl2 inductively coupled plasma (ICP) etching process. The etching rate of Escherichia coli cells was similar to that of electron beam resist or nanoimprint resist. We also demonstrated the degradation of bacterial cells by low-pressure plasma
Akihiro Matsutani, Ayako Takada
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The Journal of Physical Chemistry C, 2009
We examined the physical chemistry underlying a wet chemical etching-assisted femtosecond laser microfabrication technique. Close scrutiny of etching reagents and the etching process has led to further refinement of the method for practical use such as microchips for chemical total analysis systems (μ-TAS).
Satoshi Kiyama +3 more
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We examined the physical chemistry underlying a wet chemical etching-assisted femtosecond laser microfabrication technique. Close scrutiny of etching reagents and the etching process has led to further refinement of the method for practical use such as microchips for chemical total analysis systems (μ-TAS).
Satoshi Kiyama +3 more
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Applied Surface Science, 2002 Abstract High aspect-ratio (more than 10) microfabrication of crosslinked polytetrafluoroethylene (PTFE) has been carried out using synchrotron radiation (SR) direct photo-etching. The etching rates of crosslinked PTFE samples with various crosslinked densities were studied by changing photon fluence of SR at different sample temperatures.
T. Katoh +6 more
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New microfabrication technique on a submicrometer scale by synchrotron radiation-excited etching
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1995Synchrotron radiation-excited etching of Si, SiC, and WO3 has been investigated using a noncontact mask with a pattern of submicrometer scale. The blank pattern of the mask was replicated on the etched surface, and highly area-selective etching was realized at the size of ∼0.4 μm.
Shingo Terakado +7 more
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Microfabrication of Magnetic Tunnel Junctions Using CH$_{3}$OH Etching
IEEE Transactions on Magnetics, 2007The 100-nm-scale CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) were fabricated using a CH3OH etching process. These MTJs have steep side walls and show clear MR loops. The distributions of magnetic properties of CH3OH etched MTJs were smaller than those of conventional Ar ion etched ...
Y. Otani +6 more
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Microfabrication and evaluation of diffractive optical filters prepared by reactive sputter etching
Journal of Applied Physics, 1979Single or linearly superimposed square-wave surface-relief patterns in a transparent plate yield optical transmission characteristics similar to those of interference filters. Reactive sputter etching of fused quartz in CHF3 using Shipley 1350 H photoresist as an etch mask offers a well-controlled method to produce these complex structures.
K. Knop, H. W. Lehmann, R. Widmer
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3D microfabrication in YAG crystals by direct laser writing and chemical etching
2013 Conference on Lasers and Electro-Optics Pacific Rim (CLEOPR), 2013We report selective etching of mm-length direct laser written three-dimensional microstructures inside Nd:YAG crystals. The structures exhibit enhanced etching selectivity compared to unmodified YAG. Origin of this selectivity is investigated using Nd3+ micro-spectroscopy and micro-Raman.
Debaditya Choudhury +4 more
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