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Si etching in high-density SF6 plasmas for microfabrication: surface roughness formation
Εvangelos Gogolides
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Microfabrication of Zinc oxide surface by wet etching technique
Kenji Takahashi +5 more
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Smooth And Clean Dry Etching Of GaAs And InP For OIEC Microfabrication
LEOS 1991 Summer Topical Meetings on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices. Photonics and Optoelectronics, 2005openaire +1 more source
Microfabrication of Celluloid Microlens Array Using XeF 2 Vapor Etching and SUMP Method
Akihiro Matsutani, Ayako Takada
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