Results 271 to 280 of about 192,249 (295)
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New microfabrication technique on a submicrometer scale by synchrotron radiation-excited etching
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1995Synchrotron radiation-excited etching of Si, SiC, and WO3 has been investigated using a noncontact mask with a pattern of submicrometer scale. The blank pattern of the mask was replicated on the etched surface, and highly area-selective etching was realized at the size of ∼0.4 μm.
Kazuhiro Kaneda +7 more
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Microfabrication and evaluation of diffractive optical filters prepared by reactive sputter etching
Journal of Applied Physics, 1979Single or linearly superimposed square-wave surface-relief patterns in a transparent plate yield optical transmission characteristics similar to those of interference filters. Reactive sputter etching of fused quartz in CHF3 using Shipley 1350 H photoresist as an etch mask offers a well-controlled method to produce these complex structures.
R. Widmer, K. Knop, H. W. Lehmann
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Selective laser-induced etching for novel 3D microphotonic devices
LASEIn this work, we evaluate the advantages and limitations of the Selective Laser-induced Etching (SLE) process for the fabrication of novel three-dimensional microresonator structures.
Lara Beckmann +6 more
semanticscholar +1 more source
The Journal of Physical Chemistry C, 2009
We examined the physical chemistry underlying a wet chemical etching-assisted femtosecond laser microfabrication technique. Close scrutiny of etching reagents and the etching process has led to further refinement of the method for practical use such as microchips for chemical total analysis systems (μ-TAS).
Satoshi Kiyama +3 more
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We examined the physical chemistry underlying a wet chemical etching-assisted femtosecond laser microfabrication technique. Close scrutiny of etching reagents and the etching process has led to further refinement of the method for practical use such as microchips for chemical total analysis systems (μ-TAS).
Satoshi Kiyama +3 more
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Microfabricated Fiber Probe by Combination of Electric Arc Discharge and Chemical Etching Techniques
Advanced Materials Research, 2012In this study, optical fiber probes were fabricated by combination of electric arc discharge and chemical etching techniques. Size of tips diameters fabricated using different etching solutions were observed. When the optical fibers were pulled and heated by the electric arc discharge using a fusion splicer, fiber tips with few microns in diameter were
Sahbudin Shaari +2 more
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Advanced Materials, 1996
Silicon micromachining has a wide range of applications in, for example, microelectronics. Here, a combination of several techniques is used in modifying the surface properties of V‐shaped microtrenches (see Figure) and for fabricating complex surface relief structures.
Younan Xia, George M. Whitesides
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Silicon micromachining has a wide range of applications in, for example, microelectronics. Here, a combination of several techniques is used in modifying the surface properties of V‐shaped microtrenches (see Figure) and for fabricating complex surface relief structures.
Younan Xia, George M. Whitesides
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Fundamentals of Microfabrication
, 2002Road Map .- Lithography .- Pattern Transfer: Dry Etching, Deposition, and Doping .- Wet Bulk Micromachining .- Dry Bulk Micromachining .- Surface Micromachining .- LIGA .- Alternative Micromachining Technologies .- Electronics Used with Micromachined ...
M. Madou
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FlexMat
Gas sensing in complex environments requires advanced technologies that overcome the limitations of traditional semiconductor, electrochemical, and optical sensors.
Yuxin Zhao +6 more
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Gas sensing in complex environments requires advanced technologies that overcome the limitations of traditional semiconductor, electrochemical, and optical sensors.
Yuxin Zhao +6 more
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Near-vertical plasma-free HCl gas etching on (011) β-Ga2O3
Japanese Journal of Applied PhysicsWe investigated non-plasma HCl-gas etching properties on (011) β-Ga2O3, which is an attracting surface orientation allowing pit-free homoepitaxy. The etching occurred selectively in window regions of a patterned SiO2 mask, and resulting side-etched ...
Takayoshi Oshima, Yuichi Oshima
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