Results 281 to 290 of about 192,249 (295)

Application of SR-excited etching to microfabrication

Optics & Laser Technology, 1994
Shigeo Suzuki, Shingo Terakado
openaire   +2 more sources

Advances in glass Microfabrication Femtosecond laser irradiation followed by chemical etching

2012
Femtosecond laser irradiation followed by chemical etching (F.L.I.C.E.) is an emerging technique for the fabrication of directly buried, three-dimensional microfluidic channels in silica. The procedure attested in literature, which has been widely studied in the past years, consists of irradiating a glass slab and subsequently apply a chemical etching ...
Venturini, Francesco, Sansotera, Maurizio, Osellame, Roberto, Cerullo, Giulio, Navarrini, Walter   +9 more
openaire   +2 more sources

Controlled Microfabrication of High‐Aspect‐Ratio Structures in Silicon at the Highest Etching Rates: The Role of H2O2 in the Anodic Dissolution of Silicon in Acidic Electrolytes

, 2017
C. Cozzi, G. Polito, K. Kolasinski, G. Barillaro   +3 more
semanticscholar   +1 more source

Chemically Assisted Ion Beam Etching for Silicon‐Based Microfabrication

Journal of The Electrochemical Society, 1994
P. Chapman, Y. S. Chieh, J. P. Krusius
openaire   +2 more sources

Microfabrication and evaluation of diffractive optical filters prepared by reactive sputter etching

, 1980

openalex   +1 more source

Orientation-Resolved Chemical Kinetics: Using Microfabrication to Unravel the Complicated Chemistry of KOH/Si Etching

, 2002
Rikard A. Wind, H.A. Jones, Michael J. Little, Melissa A. Hines   +3 more
openalex   +1 more source

Single-mask, three-dimensional microfabrication of high-aspect-ratio structures in bulk silicon using reactive ion etching lag and sacrificial oxidation

, 2004
Masaru P. Rao, Marco Aimi, Noel C. MacDonald   +2 more
openalex   +1 more source

Smooth And Clean Dry Etching Of GaAs And InP For OIEC Microfabrication

LEOS 1991 Summer Topical Meetings on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices. Photonics and Optoelectronics, 2005
openaire   +2 more sources

Microfabrication of Zinc oxide surface by wet etching technique

, 2004
Kenji Takahashi, Naoki Ohashi, Isao Sakaguchi, Shunichi Hishita, Hiroshi Funakubo, Hajime Haneda   +5 more
openalex   +1 more source

Reactor to feature scale simulation studies of SiO<inf>2</inf> etching in C<inf>2</inf>F<inf>6</inf> plasma for microfabrication

, 2007
Rajesh Rajesh, A.K. Paul, A. K. Dimri
openalex   +1 more source