Results 191 to 200 of about 721,614 (296)

Textile‐Based Capacitive Pressure Sensors Enabled by Ultrasonic Spray‐Coated Carbon Black Electrodes and Electrostatic Flocking

open access: yesAdvanced Materials Interfaces, EarlyView.
A 4‐layer Kevlar‐based composite is fabricated by combining ultrasonic spraying and electrostatic flocking. Carbon black dispersion is first deposited onto Kevlar fabric to create a conductive electrode. Nylon fibers are then electrostatically flocked onto the coated fabric, forming a dielectric layer.
Mengdi Chen   +7 more
wiley   +1 more source

Holographic Lenses for See-Through Applications Recorded Without Prisms. [PDF]

open access: yesPolymers (Basel)
Sirvent-Verdú JJ   +6 more
europepmc   +1 more source

Processing‐Induced Performance Limits of Platinum Resistance Temperature Detectors for Reliable Organ‐On‐A‐Chip Sensing

open access: yesAdvanced Materials Interfaces, EarlyView.
The thermal budget imposed during oxide passivation is revealed as a key design parameter for Pt resistance temperature detectors in Organ‐on‐a‐Chip platforms. By establishing a direct processing–microstructure–device performance relationship, this work transforms an unavoidable fabrication step into a strategy for reliable integrated temperature ...
Gabriel M. Ferreira   +4 more
wiley   +1 more source

From Surface to Bulk Activation: Tailoring the Porosity and Surface Chemistry of Resorcinol‐Formaldehyde Carbon Sorbents for Atmospheric Water Harvesting

open access: yesAdvanced Materials Interfaces, EarlyView.
A bulk activation route to produce nanoporous carbons for atmospheric water harvesting by incorporating potassium hydroxide during resorcinol‐formaldehyde polycondensation. These high‐oxygen sorbents deliver daily water yields up to 23 L kg−1 day−1 with great cyclability, providing a scalable solution for water production in diverse climates.
SeyedEmad AlaviTabari   +5 more
wiley   +1 more source

Some Properties of the Plaquette Random-Cluster Model. [PDF]

open access: yesMath Phys Anal Geom
Duncan P, Schweinhart B.
europepmc   +1 more source

Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication

open access: yesAdvanced Materials Interfaces, EarlyView.
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley   +1 more source

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