Results 61 to 70 of about 2,614 (206)

Giant Spin Pumping at Polymer/Ferromagnet Interfaces for Hybrid Spintronic Devices

open access: yesAdvanced Materials Interfaces
While the growing utilization of polymers in flexible electronic devices has sparked significant interest in polymer/metal interfaces, spintronic studies of such interfaces remain limited.
Shiva Gaur   +7 more
doaj   +1 more source

Enhancing the Chemical Reactivity of Graphene through Substrate Engineering

open access: yesSmall, Volume 22, Issue 25, 4 May 2026.
This review highlights methods to enhance the reactivity of graphene through substrate engineering, focusing on strain and charge doping. Strains induced by nanoparticles, metal crystal orientations, or stretchable polymers increase the reactivity of graphene.
Jia Tu, Mingdi Yan
wiley   +1 more source

A Comparative Study of Ti/Low-k HSQ (Hydrogen Silsesquioxane) and Ti/TEOS (Tetraethylorthosilicate) Structures at Elevated Temperatures

open access: yes, 2000
For the benefit of reducing capacitance in multilevel interconnect technology, low-k dielectric HSQ (hydrogen silsesquioxane) has been used as a gapfill material in Al-metallization- based non-etchback embedded scheme.
T. L. Alford, Linghui Chen, Yuxiao Zeng
core   +1 more source

Fire modulates the structural drivers and functioning of individual‐based plant‐pollinator networks

open access: yesJournal of Ecology, Volume 114, Issue 5, May 2026.
Ecological drivers that shape (positively or negatively) the plant‐pollinator network and determine plant fitness, both before and after a fire. Abstract Fire is a natural phenomenon that shapes ecosystems, but climate change and human activities have increased its frequency and magnitude, disrupting essential ecosystem services like pollination ...
Larissa Alves‐de‐Lima   +5 more
wiley   +1 more source

Three‐dimensional Antimony Sulfide Based Flat Optics

open access: yesAdvanced Functional Materials, Volume 36, Issue 32, 20 April 2026.
This work presents the development of a grayscale electron beam lithography (g‐EBL) method for fabricating antimony trisulfide (Sb2S3) nanostructures with customizable 3D profiles. The refractive index of g‐EBL patterned Sb2S3 is determined based on the synergy of genetic algorithm and transfer matrix method.
Wei Wang   +18 more
wiley   +1 more source

The Integration of Low-k Dielectric Material Hydrogen Silsesquioxane (HSQ) with Nitride Thin Films as Barriers

open access: yes, 2000
HSQ (hydrogen silsesquioxane) is one of the promising low-k materials used in VLSI technology as an intra-metal dielectric to reduce capacitance-related issues.
T. L. Alford, Linghui Chen, Yuxiao Zeng
core   +1 more source

Process study and the lithographic performance of commercially available silsesquioxane based electron sensitive resist Medusa 82

open access: yesMicro and Nano Engineering, 2020
In the past 2 decades silsesquioxane has gained attention in the Electron Beam Lithography community as a negative tone electron-sensitive resist (HSQ) whose advantages (sub-20 nm resolution, high contrast, low Line Edge Roughness, good shape fidelity ...
Th. Mpatzaka   +8 more
doaj   +1 more source

Conundrums of Localized Surface Plasmon Resonance Biosensors

open access: yesSmall, Volume 22, Issue 19, 1 April 2026.
Localized surface plasmon resonance (LSPR) biosensing faces fundamental conundrums arising from finite field decay lengths, environmental cross‐sensitivities, and batch variability. Competing surface, bulk, and electrostatic effects can induce red or blue spectral shifts, complicating quantification, reproducibility, and interpretation in complex or ...
Nikhil Bhalla
wiley   +1 more source

Inkrementalna valjanost zadovoljstva životom u odnosu na osobine ličnosti u predikciji stilova humora

open access: yesPrimenjena Psihologija, 2013
Osnovni cilj sprovedenog istraživanja predstavlja ispitivanje prirode relacija između osobina ličnosti, zadovoljstva životom i stilova humora. Istraživanje je sprovedeno na uzorku od 180 studenata Univerziteta u Novom Sadu (98 žena i 82 muškaraca ...
Sonja Vukobrat
doaj   +1 more source

Electron–Matter Interactions During Electron Beam Nanopatterning

open access: yesAdvanced Functional Materials, Volume 36, Issue 21, 12 March 2026.
This article reviews the electron–matter interactions important to nanopatterning with electron beam lithography (EBL). Electron–matter interactions, including secondary electron generation routes, polymer radiolysis, and electron beam induced charging, are discussed.
Camila Faccini de Lima   +2 more
wiley   +1 more source

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