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Comparative Analysis of Serum Magnesium Ion Levels Using Three Measurement Methods: Spectrophotometry, Atomic Absorption Spectrophotometry, and Inductively Coupled Plasma With Optical Emission Spectrophotometry [PDF]

open access: yesInternational Journal of Analytical Chemistry
Magnesium is a cation that plays as an important cofactor in various enzymatic reactions. It is the fourth most abundant cation in the body after sodium, potassium, and calcium.
Raja Iqbal Mulya Harahap   +5 more
doaj   +2 more sources

On the Quenching of Electron Temperature in Inductively Coupled Plasma. [PDF]

open access: yesMaterials (Basel), 2023
Electron temperature has attracted great attention in plasma processing, as it dominates the production of chemical species and energetic ions that impact the processing. Despite having been studied for several decades, the mechanism behind the quenching of electron temperature with increasing discharge power has not been fully understood. In this work,
Seong I   +8 more
europepmc   +3 more sources

Power Dissipation of an Inductively Coupled Plasma Torch under E Mode Dominated Regime

open access: yesMicromachines, 2021
This paper focuses on the power dissipation of a plasma torch used for an optical surface fabrication process. The process utilizes an inductively coupled plasma (ICP) torch that is equipped with a De-Laval nozzle for the delivery of a highly collimated ...
Nan Yu   +5 more
doaj   +1 more source

Three-Dimensional Simulation Research on Discharge Characteristics of Inductively Coupled Plasma [PDF]

open access: yesHangkong bingqi, 2022
Aiming at the discharge problem of inductively coupled plasma (ICP), a closed wave-transmitting cavi-ty configuration is designed, the fluid mechanics model of ICP is established, and the multi physical simulation software COMSOL is used for three ...
Guo Xu, Li Yinghui, Qiu Chenlin, Chang Yipeng, Wang Yaodong
doaj   +1 more source

A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide

open access: yesMaterials, 2021
The inductively coupled plasma reactive ion etching (ICP-RIE) is a selective dry etching method used in fabrication technology of various semiconductor devices.
K. Racka-Szmidt   +4 more
semanticscholar   +1 more source

The Effect of Power on Inductively Coupled Plasma Parameters

open access: yesIraqi Journal of Physics, 2022
In this work, we studied the effect of power variation ​​on inductively coupled plasma parameters using numerical simulation. Different values ​​were used for input power (750 W-1500 W), gas temperature 300K, gas pressure (0.02torr),         5 tourns of
Hawraa Hafh Marza, Thamir H. Khalaf
doaj   +1 more source

Inductively Coupled Plasma (ICP) [PDF]

open access: yes, 2021
Abstract The crushed powder from defined dust particlesize fractions was analyzed using inductively coupled spectrometry plasma (ICP) for major and trace elements. The ICP was used for the determination of concentrations of trace elements and six major elements: (Al, Fe, Mg, Ca, Na, and
Fatin Al-Mutawaa   +3 more
openaire   +2 more sources

Optical-emission spectrometry method with inductively coupled plasma for determining the mass concentration of phosphorus in an oil-water emulsion

open access: yesЛитьë и металлургия, 2021
A method for determining the mass concentration of phosphorus in a water-oil emulsion used for wire drawing by inductively coupled plasma optical emission spectrometry has been developed.
N. A. Zmeeva,, O. Yu. Vinokurova
doaj   +1 more source

Study of the content of rare and rare earth elements in ash and slag waste of the Kemerovo state district power plant [PDF]

open access: yesE3S Web of Conferences, 2021
In the context of restrictions due to the sanctions imposed, a key factor in the country's development is the development of new Russian high-tech materials and their production technologies.
Cherkasova Tatiana   +3 more
doaj   +1 more source

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