Results 341 to 350 of about 491,465 (364)

[16] Inductively coupled plasma-emission spectrometry

1988
Publisher Summary This chapter discusses the inductively coupled plasma-emission spectrometry (ICP). The ICP owes its popularity as an emission source to a number of attractive features but primarily to the fact that it enables simultaneous or rapid sequential multielement determination of major, minor, trace, and ultratrace elemental sample ...
openaire   +3 more sources

Microfabrication of inductively coupled plasma reactors

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science (Cat. No.00CH37087), 2000
Summary form only given. Microelectromechanical systems (MEMS) hold promise for incorporating sensors, actuators, and microelectronics in a single, monolithic package. It is also useful to include plasma generation capability within some MEMS devices for applications such as spectroscopic chemical analysis, mass spectrometry, micropropulsion, lighting,
Y. Yin, Jeffrey Hopwood
openaire   +2 more sources

Inductively coupled plasmas

Analytical Chemistry, 1974
Velmer A. Fassel, Richard N. Kniseley
openaire   +2 more sources

Inductively Coupled Plasma [PDF]

, 2014
Toshiaki Makabe, Zoran Lj. Petrovic
openaire   +1 more source

The application of laser ablation-inductively coupled plasma-mass spectrometry to in situ U–Pb zircon geochronology

, 2004
S. Jackson, N. Pearson, W. Griffin, E. Belousova   +3 more
semanticscholar   +1 more source

Kinetics of etching in inductively coupled plasmas

Applied Surface Science, 2004
Abstract A modified Langmuir type surface kinetics model was developed in our previous work for interpreting the overall etching behavior of silicon based materials in fluorocarbon discharges using inductively coupled plasma (ICP) reactors. This kinetics model was tested for the global applicability to the ICP etching, either for the etching of non ...
openaire   +2 more sources

Design of Inductively Coupled Plasma

Industrial & Engineering Chemistry Process Design and Development, 1968
W. E. Ranz, D. R. Armstrong
openaire   +2 more sources

Improvements in 230Th dating, 230Th and 234U half-life values, and U–Th isotopic measurements by multi-collector inductively coupled plasma mass spectrometry

, 2013
Hai-Ou Cheng, R. Edwards, Chuan‐Chou Shen, V. Polyak, Y. Asmerom, J. Woodhead, J. Hellstrom, Yongjin Wang, X. Kong, C. Spötl, Xianfeng Wang, E. Alexander   +11 more
semanticscholar   +1 more source

Magnetic solid phase extraction coupled with inductively coupled plasma mass spectrometry for the speciation of mercury in environmental water and human hair samples.

Talanta: The International Journal of Pure and Applied Analytical Chemistry, 2016
Shishuai Ma, M. He, Beibei Chen, Wenchao Deng, Qi Zheng, Bin Hu   +5 more
semanticscholar   +1 more source

Inductively coupled plasmas

2011
Nicholas Braithwaite, Pascal Chabert
openaire   +2 more sources