Results 201 to 210 of about 2,685,602 (356)

A Microfluidic Multiplex Sorter for Strain Development

open access: yesAdvanced Materials Technologies, Volume 10, Issue 6, March 18, 2025.
A new multiplex method for high‐throughput screening of yeast strains based on glucoamylase production is presented. Droplets containing single mutant yeast cells are incubated for enzyme production. A sorting platform divides mutants by their high‐ and mid‐activity levels.
Chiara Leal‐Alves   +6 more
wiley   +1 more source

Printed Interconnects for Heterogeneous Systems Integration on Flexible Substrates

open access: yesAdvanced Materials Technologies, Volume 10, Issue 6, March 18, 2025.
Key components (sensors, energy devices, communication devices, computing chips, and interconnects) of flexible hybrid electronic (FHE) system connected via conductive printed metal tracks. The figure in the insets shows out‐of‐plane printed interconnects providing opportunities for lithography‐free formation of VIAs, in‐plane access of UTCs pads, and ...
Abhishek Singh Dahiya   +3 more
wiley   +1 more source

AI‐Enhanced Gait Analysis Insole with Self‐Powered Triboelectric Sensors for Flatfoot Condition Detection

open access: yesAdvanced Materials Technologies, Volume 10, Issue 6, March 18, 2025.
The given research presents an innovative insole‐based device employing self‐powered triboelectric nanogenerators (TENG) for flatfoot detection. By integrating TENG tactile sensors within an insole, the device converts mechanical energy from foot movements to electrical signals analyzed via machine learning, achieving an 82% accuracy rate in flatfoot ...
Moldir Issabek   +7 more
wiley   +1 more source

“Three‐Color” Chemical Selectivity between Oxide, Nitride, and Silicon: Area‐Selective Deposition of Metal Oxide and Polymer on SiN and Si‐H versus SiO2

open access: yesAdvanced Materials Technologies, EarlyView.
Molybdenum hexafluoride as a pretreatment is able to create a chemical contrast between SiN and SiO2 surfaces via selective fluorine passivation of the oxide. One dose of MoF6 enabled 9.7 nm of selective deposited TiO2 on SiN versus SiO2 with selectivity >0.92 on a nanoscale SiN/SiO2 patterned surface.
Jeremy M. Thelven   +6 more
wiley   +1 more source

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