Results 181 to 190 of about 33,941 (261)

A streamlined set-up for Lloyd's mirror interference lithography, using a single-mode-fibre-coupled laser. [PDF]

Microsyst Nanoeng
Lian E, Perivolari E, Liu Y, deMello JC.
europepmc   +1 more source

From Fiber Bundles to Architected Membranes: Triply Periodic Minimal Surface Architectures for Biohybrid Artificial Lungs

Advanced Materials, EarlyView.
Additively manufactured triply periodic minimal surface (TPMS) membranes offer an architecture‐driven alternative to hollow fiber bundles in artificial lungs. Multiphysics simulations and endothelialized prototypes show that the 3D‐printable membrane architecture improves gas exchange, blood flow distribution, and hemocompatibility, enabling ...
Michael Pflaum, Kai P. Barbian, Florian Neuhaus, Gerrit Sitarz, Carolin Nölke, Sebastian V. Jansen, John Linkhorst, Lukas T. Hirschwald, Sebastian Brosch, Christian Certa, Ulrich Steinseifer, Matthias Wessling, Jutta Arens, Arjang Ruhparwar, Bettina Wiegmann   +14 more
wiley   +1 more source

Protocol for quantifying the adhesive strength of single fluorescent cells adhering to a non-fluorescent cell monolayer by fluidic force microscopy. [PDF]

MethodsX
Gunaratnam G, Oh E, Jung P, Bischoff M, Metzger W.   +4 more
europepmc   +1 more source

Establishing Atomic Coherence in Twisted Oxide Membranes Containing Volatile Elements

Advanced Materials, EarlyView.
Twisted oxide membranes containing volatile elements often suffer from amorphous interfacial dead layers that suppress coupling. An oxygen‐annealing strategy establishes atomically coherent and chemically bonded interfaces in twisted NaNbO3 membranes, enabling coherent oxide moiré architectures in volatile‐element‐containing systems.
Young‐Hoon Kim, Reza Ghanbari, Min‐Hyoung Jung, Yang Zhang, Young‐Min Kim, Ruijuan Xu, Miaofang Chi   +6 more
wiley   +1 more source

Laser-Based Polishing of Additively Manufactured PA12 and PAEK Polymer Components Using a Robotic System. [PDF]

Polymers (Basel)
Uluz E, Metz L, Hedwig L, Bremen S.
europepmc   +1 more source

Soft Skins With Reversible Thickness Morphing: Materials, Mechanisms, and Applications

Advanced Materials, EarlyView.
Evolution of electronic skin (e‐skin) technologies toward adaptive, multifunctional soft skins. Phase I highlights early rigid and discrete sensory interfaces. Phase II shows the transition toward flexible, stretchable, and large‐area e‐skin. Phase III captures the emergence of computational e‐skin.
Oliver Ozioko, Chiamaka Akah, Ravinder Dahiya   +2 more
wiley   +1 more source

Experimental Study on Laser-Induced Damage Performance of CO₂ Laser-Polished Fused Silica Components. [PDF]

Micromachines (Basel)
Tan T, Xu Q, Wang S, Zhuo J, Geng F, Liu Z, Jin H, Wang X, Liu H, Zhang Q.   +9 more
europepmc   +1 more source

Origin of Dark Current Robustness in Photomultiplication Organic Photodetectors Enabled by Ionic Conjugated Electron‐Blocking Layers

Advanced Materials, EarlyView.
Ionic conjugated polyelectrolyte electron‐blocking layers enable photomultiplication organic photodetectors with dark current robustness up to −10 V and external quantum efficiencies exceeding 3000%. Fowler–Nordheim tunneling, interfacial dipole, trap density of states, and noise analyses reveal how ionic conjugated polyelectrolytes suppress electron ...
Yelim Kang, Min Hun Jee, Shuai Zhang, Sang Heon Lee, Jung Min Ha, Xingchao Zhao, Xiaoling Ma, Huiseong Shin, Changhwan Shin, Soonyong Lee, Fujun Zhang, Jae Won Shim, Han Young Woo   +12 more
wiley   +1 more source

Effect of ultrasonic power settings on intracanal biofilm reduction. [PDF]

Clin Oral Investig
Louzada VG, Oliveira-Silva M, Goulart RS, Pitondo-Silva A, Leoni GB.   +4 more
europepmc   +1 more source

Barrier‐Assisted Plasma Doping for Spatially Selective Resistance Engineering in MoS2 Transistors

Advanced Materials, EarlyView.
Barrier‐assisted NH3 plasma doping enables damage‐free, spatially selective carrier modulation in monolayer MoS2 transistors. An ultrathin pV3D3/Al2O3 protective‐dielectric stack acts as a chemical filter that allows NHx radicals to reach the MoS2 surface while blocking plasma damage. This process achieves a high electron concentration of 4.3 × 1013 cm−
Inseong Lee, Joonho Park, Seungsun Yoo, Seunghyun Yu, Mingu Kang, Seohak Park, Min Kyu Lee, Hyeongjin Lim, Dongyoung Kim, Kunwoo Roh, Sejin Kim, Kihyuk Kim, Wonbae Ahn, Kibum Kang, Yong‐Hoon Kim, Sung‐Yool Choi   +15 more
wiley   +1 more source