Results 121 to 130 of about 14,415 (276)
Lithography‐Compatible Conductive Metal–Organic Frameworks for Scalable Electronics
Conductive MOF thin films are integrated as gate electrodes in semiconductor devices through a photolithography‐compatible patterning strategy. CVD‐grown 2D MOF thin films enable stable operation across bottom‐gate MoS2/MoTe2 field‐effect transistors and top‐gate IGZO arrays, highlighting the potential of conductive MOFs as functional electronic ...
Hyeonwoo Lee +9 more
wiley +1 more source
Strong Coupling in Bulk Nanoplasmonic Nanoplatelet Perovskite Scintillators
A bulk scintillating nanocomposite is engineered from CsPbBr3 nanoplatelets and Ag nanocubes to support exciton–plasmon strong coupling under X‐ray excitation. The resulting hybrid polaritonic states appear directly in radioluminescence, opening a route toward polariton‐enabled scintillator design beyond conventional Purcell enhancement.
Michal Makowski +13 more
wiley +1 more source
Self‐invalidating multilayer physical unclonable functions (PUFs) integrate fingerprint‐like metal nanopattern bilayers from block copolymer templates with highly reactive reduced graphene oxide (rGO) interlayers. This tamper‐responsive architecture blocks all unauthorized physical and chemical replication attempts while autonomously deactivating ...
Gyu Hui Jo +7 more
wiley +1 more source
Controlled Growth of Boron Nitride in Various Phases
Phase‐selective boron nitride growth is presented as a unified materials‐design problem across hexagonal, rhombohedral, cubic, and amorphous phases. By linking synthesis routes to thermodynamic stability, kinetic accessibility, surface diffusion, interfacial templating, and energetic activation, this review clarifies how bonding and stacking are ...
Pan Wu +6 more
wiley +1 more source
Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley +1 more source
Dental Microwear Texture Analysis on Radular Teeth
3D microwear textures reveal how gastropod radular teeth respond to controlled abrasive contact. Distinct surface signatures distinguish regular abrasion from fracture‐dominated material removal, showing how mineralized coatings, fibrous cores, and substrate properties jointly shape wear and failure in a biological scraping interface.
Wencke Krings +2 more
wiley +1 more source
Advanced Manufacturing of Composite‐Based Systems for Energy Applications
Advanced manufacturing enables the integration of polymers, ceramics, metal oxides, and composites into architected microstructures with tailored transport pathways. By coupling material selection, manufacturing strategy, and structural design, multifunctional energy systems can simultaneously improve electrochemical performance, thermal management ...
Sri Vaishnavi Thummalapalli +13 more
wiley +1 more source
Microfabrication of Soft Millirobots Propelled by Low Voltage Electrohydraulic Actuators
Manual layer‐by‐layer assembly is replaced by wafer‐level MEMS batch fabrication for compliant polymer‐based electrohydraulic actuators. The microfabricated devices integrate sacrificially defined microcavities, Parylene‐C‐sealed inlets, and multilayer polymer–metal films.
Shai Shmulevich +2 more
wiley +1 more source
Coherent manipulation of ultracold Rubidium
The production of dense samples of atoms whose translational velocity can be parameterized by temperatures in the microkelvin range has revolutionized the fields of spectroscopy, metrology, quantum computing and sensitive tests of quantum mechanics. Such
Himsworth, Matthew
core +1 more source
Wafer‐Scale Top‐Down Patterning of Metal Halide Perovskites
Wafer‐scale patterning of metal halide perovskite films is demonstrated on 150 mm substrates using a chemically amplified resist, polymethyl methacrylate (CAR‐PMMA) and a single reactive ion etching step. The streamlined process preserves film luminescence while defining submicrometer features across the full wafer, enabling dense, scalable integration
Federico Fabrizi +7 more
wiley +1 more source

