Results 251 to 260 of about 228,991 (341)
This work paves the way for practical photoelectrochemical water splitting devices by addressing key upscaling challenges related to substrate conductivity, absorber inhomogeneity, and mass transfer limitations. Integrated improvements in substrate engineering, material processing, device architecture, and operational conditions allow the development ...
Telmo da Silva Lopes +7 more
wiley +1 more source
Patterning Fidelity Enhancement and Aberration Mitigation in EUV Lithography Through Source-Mask Optimization. [PDF]
Wang Q, Wu Q, Li Y, Liu X, Li Y.
europepmc +1 more source
The Brookhaven Superconducting X-Ray Lithography Source (SXLS)
J.B. Murphy +20 more
openalex +1 more source
Fabrication of 150 nm Half-Pitch Grating Templates for Nanoimprint Lithography
Shenqi Xie +5 more
openalex +2 more sources
A healthy gut barrier shields underlying fibroblasts from luminal shear forces, illustrating that “good fences make good neighbors.” Barrier damage exposes fibroblasts to shear stress, inducing cell death and the emergence of stress‐adapted, profibrotic fibroblasts. Sustained shear exposure promotes the formation of stiff aggregates of mechanoadapative
Soyoun Min +6 more
wiley +1 more source
Radiative Cooling with Transparent Microstructured Hybrid Organic-Inorganic Polymer Film Fabricated by Nanoimprint Lithography. [PDF]
Dimogerontaki N +2 more
europepmc +1 more source
Corner Rounding in Photoresists for Extreme Ultraviolet Lithography
Christopher N. Anderson
openalex +1 more source
Challenges and limits to patterning using extreme ultraviolet lithography [PDF]
Harry Levinson
openalex +1 more source
Photon‐Sphere Modes in Curved Optical Microcavities: A Black‐Hole Analogue Laser
An optical analogue of a Schwarzschild black hole is realized using curved microcavities that preserve light‐like geodesics. A new family of laser modes confined around the photon sphere is identified alongside conventional whispering‐gallery modes. Analytical theory, numerical simulations, and experiments reveal curvature‐induced confinement, enabling
Chenni Xu +9 more
wiley +1 more source
High-Efficiency Fiber Edge Coupling for Silicon Nitride Integrated Photonics. [PDF]
Avdeev SS +14 more
europepmc +1 more source

