Results 331 to 340 of about 301,025 (376)
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High-NA EUV lithography exposure tool: program progress
Advanced Lithography, 2020While EUV systems equipped with a 0.33 Numerical Aperture (NA) lens are entering high volume manufacturing, ASML and ZEISS are in parallel ramping up their activities on an EUV exposure tool with an NA of 0.55.
J. van Schoot +11 more
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LithoGAN: End-to-End Lithography Modeling with Generative Adversarial Networks
Design Automation Conference, 2019Lithography simulation is one of the most fundamental steps in process modeling and physical verification. Conventional simulation methods suffer from a tremendous computational cost for achieving high accuracy.
Wei Ye +3 more
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Nanotechnology, 2008 An example of non-optical lithographies is nanoimprint lithography. The state of the art in this versatile nanofabrication method is reviewed, including the scientific challenges, such as nano-scale rheology and mechanical stability, and engineering challenges, such as the competing constraints for a high volume production. The latter is coupled to the
Jouni Ahopelto +2 more
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Nature Nanotechnology, 2015
The optical and electrical properties of heterogeneous nanowires are profoundly related to their composition and nanoscale architecture. However, the intrinsic constraints of conventional synthetic and lithographic techniques have limited the types of multi-compositional nanowire that can be created and studied in the laboratory. Here, we report a high-
Tuncay, Ozel +2 more
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The optical and electrical properties of heterogeneous nanowires are profoundly related to their composition and nanoscale architecture. However, the intrinsic constraints of conventional synthetic and lithographic techniques have limited the types of multi-compositional nanowire that can be created and studied in the laboratory. Here, we report a high-
Tuncay, Ozel +2 more
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Lithography-Based Nanoelectrochemistry
Analytical Chemistry, 2011Lithographically fabricated nanostructures appear in an increasingly wide range of scientific fields, and electroanalytical chemistry is no exception. This article introduces lithography methods and provides an overview of the new capabilities and electrochemical phenomena that can emerge in nanostructures.
Liza Rassaei +2 more
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Hydrodynamic Focusing Lithography
Angewandte Chemie, 2009Anisotropic multifunctional particles hold great promise for drug delivery, imaging, and construction of building blocks for dynamic mesostructures such as self-assembled tissues and 3-D electrical circuits. Of particular interest, multifunctional particles with unique barcodes have been suggested as diagnosis tools for rapid screening of biomolecules.
Ki Tae Bong +3 more
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Stochastic printing failures in EUV lithography
Advanced Lithography, 2019This paper continues our work on what we call stochastic printing failures, i.e. random, non-repeating, isolated defects which we believe to be the result of the particle nature of light and matter, and of the probabilistic nature of their behavior and ...
P. De Bisschop, E. Hendrickx
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Lithography-free reconfigurable photonic processor
Nature Photonics, 2023A. Ovvyan, W. Pernice
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2010
This chapter discusses the lithography considerations prior to wafer processing, including layout design such as the rules concerning minimum lines and spaces, required overlaps, recommended and/or forbidden shapes. The selection of the required photoresists for different applications is discussed. The process sequence of wafer lithography is described.
Sami Franssila, Santeri Tuomikoski
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This chapter discusses the lithography considerations prior to wafer processing, including layout design such as the rules concerning minimum lines and spaces, required overlaps, recommended and/or forbidden shapes. The selection of the required photoresists for different applications is discussed. The process sequence of wafer lithography is described.
Sami Franssila, Santeri Tuomikoski
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Combined lithographies for the reduction of stitching errors in lithography
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1994A new way of lithography is presented, which makes use of overlapping address fields to expose patterns by conventional or unconventional lithographies and uses the overlap area to position subsequent pattern areas with high accuracy by image processing.
J. Kretz, Markus Weber, Hans W. P. Koops
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