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IEEE Circuits and Devices Magazine, 1988
Current capabilities and advances in optical electron-beam, X-ray, and ion-beam lithography are discussed. Attention is restricted to the creation of the resist pattern. Equipment, resists, and processing are examined. >
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Current capabilities and advances in optical electron-beam, X-ray, and ion-beam lithography are discussed. Attention is restricted to the creation of the resist pattern. Equipment, resists, and processing are examined. >
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Imprint Lithography with 25-Nanometer Resolution
Science, 1996S. Chou, P. R. Krauss, P. J. Renstrom
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Bio-resin for high resolution lithography-based biofabrication of complex cell-laden constructs
Biofabrication, 2018K. Lim+10 more
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2016
At the heart of lithography are chemical transformations designed to print a relief image of an object on a flat surface. The printing involves the registration of information in the imaging layer, referred to as the resist, by means of electromagnetic radiation, or molecular self-assembly, or by embossing/imprinting.
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At the heart of lithography are chemical transformations designed to print a relief image of an object on a flat surface. The printing involves the registration of information in the imaging layer, referred to as the resist, by means of electromagnetic radiation, or molecular self-assembly, or by embossing/imprinting.
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Nanofabrication by electron beam lithography and its applications
, 2015Yifang Chen
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Fabrication of photonic crystals for the visible spectrum by holographic lithography
Nature, 2000M. Campbell+5 more
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